ZrO2 thin films have been prepared by laser ablation of Zr or ZrO2 targets in oxygen reactive atmosphere. The influence of the deposition parameters as oxygen pressure and target composition. on the structure and morphology of the deposited layers has been studied. Scanning electron microscopy, secondary ion mass spectroscopy and dielectric constant measurements have been performed to characterize the deposited layers. Dielectric constant values in the, range 15-20 and low losses were evidenced for samples prepared in a narrow range of experimental conditions. (C) 2002 Elsevier Science Ltd. All rights reserved
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assi...
Studies of ZrO2 films prepared by d.c. reactive magnetron sputtering are described. The effects of s...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...
ZrO2, films were deposited by electron-beam evaporation with the oxygen partial pressure varying fro...
Thin films of zirconium silicate were obtained by alternative ablation of Zr and Si targets in oxyge...
Using reactive magnetron sputtering from metallic cathodes, ZrO2 thin films on quartz substrates wer...
Thin films of ZrO2 have been deposited by ALD on Si(100) and SIMOX using two different metalorganic ...
Thin films of ZrO2 have been deposited by ALD on Si(100) and SIMOX using two different metalorganic ...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
In this paper, ZrO2 thin films were grown on glass substrates using RF magnetic sputtering method. I...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
Thin films of oxides have been largely used in microelectronics and as thermal barriers. It has been...
It has been found that pulsed laser ablation has good potentiality for the deposition of ZrO2, CeO2,...
In this investigation ZrO2 samples were prepared by a dc magnetron reactive sputtering. The samples ...
Zirconium oxide is one of the most extensively studied transition-metal oxides for its several attra...
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assi...
Studies of ZrO2 films prepared by d.c. reactive magnetron sputtering are described. The effects of s...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...
ZrO2, films were deposited by electron-beam evaporation with the oxygen partial pressure varying fro...
Thin films of zirconium silicate were obtained by alternative ablation of Zr and Si targets in oxyge...
Using reactive magnetron sputtering from metallic cathodes, ZrO2 thin films on quartz substrates wer...
Thin films of ZrO2 have been deposited by ALD on Si(100) and SIMOX using two different metalorganic ...
Thin films of ZrO2 have been deposited by ALD on Si(100) and SIMOX using two different metalorganic ...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
In this paper, ZrO2 thin films were grown on glass substrates using RF magnetic sputtering method. I...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
Thin films of oxides have been largely used in microelectronics and as thermal barriers. It has been...
It has been found that pulsed laser ablation has good potentiality for the deposition of ZrO2, CeO2,...
In this investigation ZrO2 samples were prepared by a dc magnetron reactive sputtering. The samples ...
Zirconium oxide is one of the most extensively studied transition-metal oxides for its several attra...
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assi...
Studies of ZrO2 films prepared by d.c. reactive magnetron sputtering are described. The effects of s...
Zirconium oxide (ZrO2) is an important material with a potential for a wide range of technological a...