Microvia interconnectors are a critical element of 3D packaging technology, as they provide the shortest interconnection path between stacked chips. However, low efficiency of microvia filling is a long-standing problem. This study proposed a two-step method to enhance the electroplating filling efficiency by pre-setting metal particles in microvias and later electroplating the Cu to fill the gaps among the pre-settled particles. Since these particles occupy a certain volume in the microvia, less electroplating Cu is needed for microvia filling, leading to a shorter electroplating period
Through-chip electrodes for three-dimensional packaging can offer short interconnection and reduced ...
Nowadays, high performance of integrated circuits is owing its interconnections and packaging techno...
Copper is a well-known material used for interconnections application. It offers economical advanta...
The filling of microvias with diameters between 30 and 100 μm and aspect ratios up to 2.5 in silicon...
This work explores the mechanism of microvia filling by copper electroplating using a printed circui...
We present two approaches to reduce the process time needed for filling vias of 5 µm diameter and 25...
The filling of microvias with a diameter of 5 µm and a depth of 25 µm (aspect ratio of 5) by copper ...
The development of high density interconnects (HDI) for IC packaging substrate and printed circuit b...
Microvia filling by copper electroplating was carried out using a plating bath containing a suppress...
International audienceIn order to anticipate the further demands of miniaturization and integration ...
High density interconnections (HDI) between multilayers and microvias are used in state-of-the-art p...
International audienceIn order to anticipate the further demands of miniaturization and integration ...
Electrochemical thermodynamics is the foundation of the microvia fill process, whose model represent...
International audienceIn order to anticipate the further demands of miniaturization and integration ...
Through-chip electrodes for three-dimensional packaging can offer short interconnection and reduced ...
Through-chip electrodes for three-dimensional packaging can offer short interconnection and reduced ...
Nowadays, high performance of integrated circuits is owing its interconnections and packaging techno...
Copper is a well-known material used for interconnections application. It offers economical advanta...
The filling of microvias with diameters between 30 and 100 μm and aspect ratios up to 2.5 in silicon...
This work explores the mechanism of microvia filling by copper electroplating using a printed circui...
We present two approaches to reduce the process time needed for filling vias of 5 µm diameter and 25...
The filling of microvias with a diameter of 5 µm and a depth of 25 µm (aspect ratio of 5) by copper ...
The development of high density interconnects (HDI) for IC packaging substrate and printed circuit b...
Microvia filling by copper electroplating was carried out using a plating bath containing a suppress...
International audienceIn order to anticipate the further demands of miniaturization and integration ...
High density interconnections (HDI) between multilayers and microvias are used in state-of-the-art p...
International audienceIn order to anticipate the further demands of miniaturization and integration ...
Electrochemical thermodynamics is the foundation of the microvia fill process, whose model represent...
International audienceIn order to anticipate the further demands of miniaturization and integration ...
Through-chip electrodes for three-dimensional packaging can offer short interconnection and reduced ...
Through-chip electrodes for three-dimensional packaging can offer short interconnection and reduced ...
Nowadays, high performance of integrated circuits is owing its interconnections and packaging techno...
Copper is a well-known material used for interconnections application. It offers economical advanta...