Nanostructuring poly-[2-methoxy-5-(2 '-ethyl-hexiloxy)-p-phenylenevinylene] thin films by high-temperature soft lithography

Sub micron patterning of the conjugated polymer, poly-[2-methoxy-5-(2'-ethyl-hexiloxy)-p-phenylenevinylene] (MEH-PPV) has been achieved by high-temperature soft lithography. The process has been carried out by placing a spin-coated polymer film in conformal contact with elastomeric replicas of master structures fabricated by electron beam lithography. The system is then heated to decrease the polymer viscosity, allowing the pattern transfer with resolution down to 300 nm. The well-preserved photoluminescence spectrum and efficiency of the emissive polymer clearly indicate that high-temperature soft lithography can be successfully applied for the one-step realization of organic-based devices. (C) 2003 Elsevier B.V. All rights reserved