A PIC-MCC/fluid hybrid model was employed to study a parallel-plate capacitively coupled radio-frequency discharge in hydrogen, under the application of a dc bias voltage. When a negative dc voltage was applied to one of the electrodes of a continuous wave (cw) plasma, a 'beam' of secondary electrons was formed that struck the substrate counter-electrode at nearly normal incidence. The energy distribution of the electrons striking the substrate extended all the way to VRF + |Vdc|, the sum of the peak RF voltage and the absolute value of the applied dc bias. Such directional, energetic electrons may be useful for ameliorating charging damage in etching of high aspect ratio nano-features. The vibrational distribution function of molecular hyd...
Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure (~1 Torr) are ex...
The paper presents a systematic characterization of pure hydrogen capacitively coupled discharges, p...
Although hydrogen is the main component of many gas mixtures used for plasma processing, the physics...
A PIC-MCC/fluid hybrid model was employed to study a parallel-plate capacitively coupled radio-frequ...
International audienceA combined computational-experimental study was performed of a geometrically s...
International audienceParallel plate capacitively coupled plasmas (CCPs) are commonly used for mater...
A particle-in-cell plus Monte Carlo collision model is employed to investigate the low pressure hydr...
This paper presents a systematic characterization of hydrogen capacitively coupled very high frequen...
A particle-in-cell plus Monte Carlo collision model is employed to investigate the low pressure hydr...
This paper presents a systematic characterization of hydrogen capacitively coupled very high frequen...
This work presents modeling and experimental results for the electrical characterization of capaciti...
Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure (∼1 Torr) are ex...
Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure ( 1 Torr) a...
International audienceA comprehensive hybrid model of a hydrogen capacitively coupled plasma, includ...
Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure (~1 Torr) are ex...
The paper presents a systematic characterization of pure hydrogen capacitively coupled discharges, p...
Although hydrogen is the main component of many gas mixtures used for plasma processing, the physics...
A PIC-MCC/fluid hybrid model was employed to study a parallel-plate capacitively coupled radio-frequ...
International audienceA combined computational-experimental study was performed of a geometrically s...
International audienceParallel plate capacitively coupled plasmas (CCPs) are commonly used for mater...
A particle-in-cell plus Monte Carlo collision model is employed to investigate the low pressure hydr...
This paper presents a systematic characterization of hydrogen capacitively coupled very high frequen...
A particle-in-cell plus Monte Carlo collision model is employed to investigate the low pressure hydr...
This paper presents a systematic characterization of hydrogen capacitively coupled very high frequen...
This work presents modeling and experimental results for the electrical characterization of capaciti...
Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure (∼1 Torr) are ex...
Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure ( 1 Torr) a...
International audienceA comprehensive hybrid model of a hydrogen capacitively coupled plasma, includ...
Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure (~1 Torr) are ex...
The paper presents a systematic characterization of pure hydrogen capacitively coupled discharges, p...
Although hydrogen is the main component of many gas mixtures used for plasma processing, the physics...