Time resolved in situ spectroscopy during formation of the GaP Si 100 heterointerface

Though III V Si 100 heterointerfaces are essential for future epitaxial high performance devices, their atomic structure is an open historical question. Benchmarking of transient optical in situ spectroscopy during chemical vapor deposition to chemical analysis by X ray photoelectron spectroscopy enables us to distinguish between formation of surfaces and of the heterointerface. A terrace related optical anisotropy signal evolves during pulsed GaP nucleation on single domain Si 100 surfaces. This dielectric anisotropy agrees well with the one calculated for buried GaP Si 100 interfaces from differently thick GaP epilayers. X ray photoelectron spectroscopy reveals a chemically shifted contribution of the P and Si emission lines, which quantitatively corresponds to one monolayer and establishes simultaneously with the nucleation related optical in situ signal. We attribute that contribution to the existence of Si P bonds at the buried heterointerface. During further pulsing and annealing in phosphorus ambient, dielectric anisotropies known from atomically well ordered GaP 100 surfaces super impose the nucleation related optical in situ spectra. Figure Presente