A combined sensor for the investigation of plasma based surface engineering processes has been developed, which basically consists of a quartz crystal microbalance that is simultaneously used as a heat flux sensor and a planar Langmuir probe in one active element. The sensor can thus measure deposition flux, heat flux, and charged particle flux laterally resolved at the same time and position. The setup and working principle of the sensor are shown, and the suitability for process investigations is demonstrated exemplarily for a dc magnetron sputtering discharge for Ti thin film depositio
Nowadays plasma based processes are widely used for surface modification in a great variety of indus...
As the critical dimension of the semiconductor device continues to shrink and aspect ratio continues...
We report a new development of a diagnostic technique, referred to as the wafer probe, which enables...
A combined sensor for the investigation of plasma based surface engineering processes has been devel...
A combined sensor for the simultaneous measurement of plasma and deposition parameters has been desi...
Our recently reported multifunctional plasma and deposition sensor Welzel et al., Appl. Phys. Lett....
A heatable probe has been constructed for in-situ measurement of plasma parameters in reactive plasm...
AbstractThe measurements of plasma parameters from inside a plasma boundary give more accurate resul...
The knowledge of the energy flux during plasma/surface interactions is a key parameter for the contr...
Abstract—As conventional sensors are scaled down in size for proper usage in high-density laboratory...
International audienceThe in situ characterization of space plasmas requires an instrument suite for...
A summary is given of different methods for the determination of the energy influx and its influence...
This work discusses the use of plasma technology in the fabrication of MicroElectroMechanical System...
Plasma diagnostics are a very useful tool for characterizing the main parameters ofsputtering plasma...
International audienceHeat flux microsensor--a thermopile with millisecond response time--was employ...
Nowadays plasma based processes are widely used for surface modification in a great variety of indus...
As the critical dimension of the semiconductor device continues to shrink and aspect ratio continues...
We report a new development of a diagnostic technique, referred to as the wafer probe, which enables...
A combined sensor for the investigation of plasma based surface engineering processes has been devel...
A combined sensor for the simultaneous measurement of plasma and deposition parameters has been desi...
Our recently reported multifunctional plasma and deposition sensor Welzel et al., Appl. Phys. Lett....
A heatable probe has been constructed for in-situ measurement of plasma parameters in reactive plasm...
AbstractThe measurements of plasma parameters from inside a plasma boundary give more accurate resul...
The knowledge of the energy flux during plasma/surface interactions is a key parameter for the contr...
Abstract—As conventional sensors are scaled down in size for proper usage in high-density laboratory...
International audienceThe in situ characterization of space plasmas requires an instrument suite for...
A summary is given of different methods for the determination of the energy influx and its influence...
This work discusses the use of plasma technology in the fabrication of MicroElectroMechanical System...
Plasma diagnostics are a very useful tool for characterizing the main parameters ofsputtering plasma...
International audienceHeat flux microsensor--a thermopile with millisecond response time--was employ...
Nowadays plasma based processes are widely used for surface modification in a great variety of indus...
As the critical dimension of the semiconductor device continues to shrink and aspect ratio continues...
We report a new development of a diagnostic technique, referred to as the wafer probe, which enables...