The divalent dissolution of float zone FZ Si 111 is followed by contact mode atomic force microscopy AFM in dilute ammonium fluoride solutions at pH 4. Under a variety of photoelectrochemical preparation conditions rather similar structures are found. The dissolution charges range between 9 and 22 bilayer equivalents in potentiostatic and mixed potentiostatic and chronoamperometric experiments. Mesa type structures with flat extended terraces 200 nm witdh surrounded by strongly corrugated areas are observed. Image analysis reveals that most border lines of the mesas can be obtained by drawing lines along angles of 0o, 30o and 30o and perpendicular to them with respect to a 0o reference line. Accordingly, the shape of the mesas ...
In situ photovoltage PV and photoluminescence PL are used to obtain information about the band b...
Oxidation and dissolution phenomena of Si(111) in alkaline electrolyte are investigated by a combina...
In porous silicon formations there is an increase of dissolution rate at the fluorine-covered sites ...
The initial processes leading from atomically flat Si surface to porous silicon formation are not we...
A combined photoelectrochemistry atomic force microscopy AFM investigation on divalent silicon d...
The changes of the surface topography of float zone FZ n Si 111 upon conditioning of the electro...
Porous silicon and its luminescent properties are well known for more than a decade. The origin of t...
The nanostructure formation of n type silicon photoelectrodes in fluoride containing solutions was i...
The surface condition of electrochemically H terminated Si is compared with the situation at the fir...
The initial stages of porous Si formation on Si 111 in dilute ammonium fluoride solution are analy...
Anodic dissolution of p-Si is studied in diluted fluoride solution (HF 0.05M+NH4F 0.05 M, pH 3), wit...
It is experimentally shown, in porous silicon formation, that there is an increase in dissolution ra...
Electrochemical, in situ electrochemical scanning tunneling microscope (EC-STM), and attenuated tota...
The morphology of precisely oriented n and p+ type Si(111) hydrogenated surfaces has been studied by...
Semiconductor electrochemistry has known an important development in the eighties, especially aimed ...
In situ photovoltage PV and photoluminescence PL are used to obtain information about the band b...
Oxidation and dissolution phenomena of Si(111) in alkaline electrolyte are investigated by a combina...
In porous silicon formations there is an increase of dissolution rate at the fluorine-covered sites ...
The initial processes leading from atomically flat Si surface to porous silicon formation are not we...
A combined photoelectrochemistry atomic force microscopy AFM investigation on divalent silicon d...
The changes of the surface topography of float zone FZ n Si 111 upon conditioning of the electro...
Porous silicon and its luminescent properties are well known for more than a decade. The origin of t...
The nanostructure formation of n type silicon photoelectrodes in fluoride containing solutions was i...
The surface condition of electrochemically H terminated Si is compared with the situation at the fir...
The initial stages of porous Si formation on Si 111 in dilute ammonium fluoride solution are analy...
Anodic dissolution of p-Si is studied in diluted fluoride solution (HF 0.05M+NH4F 0.05 M, pH 3), wit...
It is experimentally shown, in porous silicon formation, that there is an increase in dissolution ra...
Electrochemical, in situ electrochemical scanning tunneling microscope (EC-STM), and attenuated tota...
The morphology of precisely oriented n and p+ type Si(111) hydrogenated surfaces has been studied by...
Semiconductor electrochemistry has known an important development in the eighties, especially aimed ...
In situ photovoltage PV and photoluminescence PL are used to obtain information about the band b...
Oxidation and dissolution phenomena of Si(111) in alkaline electrolyte are investigated by a combina...
In porous silicon formations there is an increase of dissolution rate at the fluorine-covered sites ...