X-ray diffractometry analysis of r.f.-magnetron-sputtered chromium/chromium nitride coatings

The eVect of nitrogen content on the microstructure of chromium-based coatings deposited by r.f. magnetron sputtering was studied using various X-ray diVraction techniques. Cr, Cr2N and CrN were the major phases identified, respectively, for 5, 34 and 50 at.% by recording h/2h and glancing incidence (1°) scans. Between these well- identified crystallographic structures, we have noted a peak broadening with poor intensities that could be interpreted as mixtures of Cr, Cr2N and/or Cr(N) phases. The influence of nitrogen on the preferred crystal orientation of the films was investigated. Highly textured Cr(110) and CrN (111) were evidenced, and texture was found to be a function of nitrogen content in the sputtering atmosphere. Finally, the Langford method was applied for line profile analyses leading to results concerning crystallite sizes and strains