Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed steel by reactive magnetron sputtering of a tungsten carbide target in an argon-ethine atmosphere. The deposition parameters, sputtering power, bias voltage, argon and ethine flow rate, were varied according to a central composite design comprising 25 different parameter combinations. For comparison, a tungsten carbide coating was deposited, as well. During coating deposition, the process variables, total pressure, sputtering voltage and bias current, were measured as process characteristics. The thickness of the deposited coatings was determined using the crater grinding method, and the deposition rate was calculated. Young’s modulus E and inden...
In this study, WC (tungsten carbide) thin films were deposited on high-speed steel (AISI M2) and Si ...
► The mechanical properties of WC–12Co coatings were analyzed by nanoindentation. ► The nanohardness...
WS2/a-C coatings with various carbon contents (0-65 at.%) were deposited on silicon wafers by magnet...
Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed stee...
Amorphous hydrogenated carbon (a-C:H) coatings are widely used in several industrial applications. T...
Abstract The evolution of structure, mechanical properties and friction behavior of DC magnetron spu...
Superhard amorphous hydrogenated carbon (a-C:H) coatings were prepared in a large scale batch coater...
Tungsten containing diamond-like carbon (W-C:H) coatings have been produced by unbalanced magnetron ...
In this study, three different a-C:H:W coatings with predefined hardness values, ranging from 10 up ...
Tungsten containing diamond-like carbon (W-C:H) coatings have been produced by unbalanced magnetron ...
A series of tungsten-containing diamond-like carbon (Me-DLC) coatings have been produced by unbalanc...
A series of tungsten-containing diamond-like carbon (Me-DLC) coatings have been produced by unbalanc...
Hydrogenated amorphous carbon (a-C:H) films were deposited by the r.f. plasma technique in order to ...
Amorphous carbon (a-C:H and a-C:H:Me) films respond very sensitively to local overloads. For example...
The study of the growth mechanisms of amorphous hydrogenated carbon coatings (a-CH ) deposited by re...
In this study, WC (tungsten carbide) thin films were deposited on high-speed steel (AISI M2) and Si ...
► The mechanical properties of WC–12Co coatings were analyzed by nanoindentation. ► The nanohardness...
WS2/a-C coatings with various carbon contents (0-65 at.%) were deposited on silicon wafers by magnet...
Tungsten-modified hydrogenated amorphous carbon coatings (a-C:H:W) were deposited on high speed stee...
Amorphous hydrogenated carbon (a-C:H) coatings are widely used in several industrial applications. T...
Abstract The evolution of structure, mechanical properties and friction behavior of DC magnetron spu...
Superhard amorphous hydrogenated carbon (a-C:H) coatings were prepared in a large scale batch coater...
Tungsten containing diamond-like carbon (W-C:H) coatings have been produced by unbalanced magnetron ...
In this study, three different a-C:H:W coatings with predefined hardness values, ranging from 10 up ...
Tungsten containing diamond-like carbon (W-C:H) coatings have been produced by unbalanced magnetron ...
A series of tungsten-containing diamond-like carbon (Me-DLC) coatings have been produced by unbalanc...
A series of tungsten-containing diamond-like carbon (Me-DLC) coatings have been produced by unbalanc...
Hydrogenated amorphous carbon (a-C:H) films were deposited by the r.f. plasma technique in order to ...
Amorphous carbon (a-C:H and a-C:H:Me) films respond very sensitively to local overloads. For example...
The study of the growth mechanisms of amorphous hydrogenated carbon coatings (a-CH ) deposited by re...
In this study, WC (tungsten carbide) thin films were deposited on high-speed steel (AISI M2) and Si ...
► The mechanical properties of WC–12Co coatings were analyzed by nanoindentation. ► The nanohardness...
WS2/a-C coatings with various carbon contents (0-65 at.%) were deposited on silicon wafers by magnet...