During the manufacturing of printed electronic circuits, different layers of coatings are applied successively on a substrate. The correct thickness of such layers is essential for guaranteeing the electronic behavior of the final product and must therefore be controlled thoroughly. This paper presents a model for measuring two-layer systems through thin film reflectometry (TFR). The model considers irregular interfaces and distortions introduced by the setup and the vertical vibration movements caused by the production process. The results show that the introduction of these latter variables is indispensable to obtain correct thickness values. The proposed approach is applied to a typical configuration of polymer electronics on transparent...
The deposition of thin metallic films on substrates is a common procedure, with a great number of di...
The thickness characterization of transparent protective coatings on functional, transparent materia...
A method is presented whereby the thickness and complex refractive index of a very think, partially ...
The thickness measurement of transparent layers with optical techniques is very problematic. The obs...
The work contained within this thesis considers the applicability of wavefront sensing to the proble...
Continuous functional wet coating provides polymer films with additional functional properties. The ...
This paper will explore the methodologies of real-time measurement of photoresist film thickness on ...
An efficient transmission line model in the micrometric order is presented in this paper, to determi...
An in situ monitoring setup and process control loop were developed and integrated into a magnetron ...
International audienceA double-side optical profilometer based on white-light interferometry was dev...
In semiconductor and LCD manufacturing processes, film thickness and surface profile of film-covered...
It is intended to create two types of artifacts to contribute to traceable measurement results in re...
International audienceFor a long time, obtaining the optical and morphological properties of a trans...
Spectroscopic reflectometer is generally used for measuring the thickness of thin films. Optical tec...
Abstract—In microelectronics processing, coating of pho-toresist is a common process. It is importan...
The deposition of thin metallic films on substrates is a common procedure, with a great number of di...
The thickness characterization of transparent protective coatings on functional, transparent materia...
A method is presented whereby the thickness and complex refractive index of a very think, partially ...
The thickness measurement of transparent layers with optical techniques is very problematic. The obs...
The work contained within this thesis considers the applicability of wavefront sensing to the proble...
Continuous functional wet coating provides polymer films with additional functional properties. The ...
This paper will explore the methodologies of real-time measurement of photoresist film thickness on ...
An efficient transmission line model in the micrometric order is presented in this paper, to determi...
An in situ monitoring setup and process control loop were developed and integrated into a magnetron ...
International audienceA double-side optical profilometer based on white-light interferometry was dev...
In semiconductor and LCD manufacturing processes, film thickness and surface profile of film-covered...
It is intended to create two types of artifacts to contribute to traceable measurement results in re...
International audienceFor a long time, obtaining the optical and morphological properties of a trans...
Spectroscopic reflectometer is generally used for measuring the thickness of thin films. Optical tec...
Abstract—In microelectronics processing, coating of pho-toresist is a common process. It is importan...
The deposition of thin metallic films on substrates is a common procedure, with a great number of di...
The thickness characterization of transparent protective coatings on functional, transparent materia...
A method is presented whereby the thickness and complex refractive index of a very think, partially ...