Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic applications, we review the current status of the quest to generate ideal nanostructures using BCPs and directions for future research
Block copolymer (BCP) nanoimprint lithography is an attractive possible solution for manufacturing h...
AbstractBlock copolymers (BCPs) have received great attention for the past 40 years but only within ...
This comprehensive overview of block copolymer micelle nanolithography (BCMN) will discuss the synth...
Self-assembly approaches, e.g. colloidal, emulsion and polymer phase separation, provide scientists ...
This chapter presents block copolymer lithography (BCPL) in light of engineering nanoscale architect...
Block copolymers (BCP) are self-assembling polymeric materials that have been extensively investigat...
The manufacture of smaller, faster, more efficient microelectronic components is a major scientific ...
For the last 30 years, block copolymers (BCP) have held the promises of new functional nanomaterials...
Continual advancement in microelectronic performance has made microelectronics essentially ubiquitou...
Block copolymer (BCP) self-assembly has emerged as a feasible method for large-scale fabrication wit...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Materials Science and Engineeri...
AbstractBlock copolymer lithography, a process where block copolymer self-assembly is integrated wit...
As high technology device functionalities seem to constantly be moving towards decreasing critical d...
Over the course of the past 80 years, semiconductor devices have become increasingly ubiquitous in e...
Block copolymer (BCP) nanoimprint lithography is an attractive possible solution for manufacturing h...
Block copolymer (BCP) nanoimprint lithography is an attractive possible solution for manufacturing h...
AbstractBlock copolymers (BCPs) have received great attention for the past 40 years but only within ...
This comprehensive overview of block copolymer micelle nanolithography (BCMN) will discuss the synth...
Self-assembly approaches, e.g. colloidal, emulsion and polymer phase separation, provide scientists ...
This chapter presents block copolymer lithography (BCPL) in light of engineering nanoscale architect...
Block copolymers (BCP) are self-assembling polymeric materials that have been extensively investigat...
The manufacture of smaller, faster, more efficient microelectronic components is a major scientific ...
For the last 30 years, block copolymers (BCP) have held the promises of new functional nanomaterials...
Continual advancement in microelectronic performance has made microelectronics essentially ubiquitou...
Block copolymer (BCP) self-assembly has emerged as a feasible method for large-scale fabrication wit...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Materials Science and Engineeri...
AbstractBlock copolymer lithography, a process where block copolymer self-assembly is integrated wit...
As high technology device functionalities seem to constantly be moving towards decreasing critical d...
Over the course of the past 80 years, semiconductor devices have become increasingly ubiquitous in e...
Block copolymer (BCP) nanoimprint lithography is an attractive possible solution for manufacturing h...
Block copolymer (BCP) nanoimprint lithography is an attractive possible solution for manufacturing h...
AbstractBlock copolymers (BCPs) have received great attention for the past 40 years but only within ...
This comprehensive overview of block copolymer micelle nanolithography (BCMN) will discuss the synth...