Thick film resistors as cryogenic thermometers

Affronte, Marco
M., Campani
Morten, Bruno
S., Piccinini
M., Prudenziati
M., Tamborin
O., Laborde

Publication date

January 1997

Publisher

place:Singapore

Abstract

The work was aimed at assessing relatioships betwwen composition and performanceThe temperature dependence of resistance in RuO2-based TFRs was studied in the range 1.2 K to 300 K. The resistance fits the exponential relationship R=R0exp(T/T0)x with x=1/4 at higher temperatures with a transition to the x=1/2 regime on the same sample at lower temperatures (<20 K). The transition temperature Tc between these regimeshas a well defined dependence on the sample resitance Rs. Both the R0 ant T0 values scale down as the RuO2 fraction and show similar dependences on the Mn content. The magnetoresistve responses were measured in same temperature range in magnetic field H uo to 20 Tesla. The measured relative change of resistance never exceedes 0.0...

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Thick film resistors as cryogenic thermometers

Abstract

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Thick film resistors as cryogenic thermometers

Abstract

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