The size of integrated devices such as PC, mobiles etc are reducing day by day with multiple operations, all of these is happening because of the scaling down the size of MOSFETs which is the main component in memory, processors and so on. As we scale down the MOSFETs to the nanometer regime the short channel effects arises which degrades the system performance and reliability. Here in this paper we describe the alternative MOSFET called FinFET which reduces the short channel effects and its performance analysis of digital applications such as inverter circuit, nand and nor gates at 22nm and 14nm node technologies. DOI: 10.17762/ijritcc2321-8169.15050
Scaling of the MOSFET face greater challenge by extreme power density due to leakage current in ultr...
The processors and digital circuits designed today contain billions of transistors on a small piece ...
In this paper, we present the impact of downscaling of nano-channel dimensions of Indium Arsenide Fi...
According to Moore‟s Law, the no of transistors in an IC chip doubles every 18 months. This leads in...
As the scaling of the MOSFET increases due to Moore’s law the density of the circuits which are fabr...
The scaling process of the conventional 2D-planar metal-oxide semiconductor field-effect transistor ...
In the world of Integrated Circuits, Complementary Metal– Oxide–Semiconductor (CMOS) has lost its cr...
FinFET at 32 nm and beyond is an emerging transistor technology offer interesting delay–power trade...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
Semiconductor industry greatly depends on CMOS technology and now needs competent technology with ha...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
FinFET is a non planar modeling device for small size transistors (less than 45nm) will replace trad...
Planar Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) have been leading the semiconduc...
This paper describes the characteristics comparison of bulk FINFET and SOI FINFET. The scaling trend...
Technology scaling below 22 nm has brought several detrimental effects such as increased short chann...
Scaling of the MOSFET face greater challenge by extreme power density due to leakage current in ultr...
The processors and digital circuits designed today contain billions of transistors on a small piece ...
In this paper, we present the impact of downscaling of nano-channel dimensions of Indium Arsenide Fi...
According to Moore‟s Law, the no of transistors in an IC chip doubles every 18 months. This leads in...
As the scaling of the MOSFET increases due to Moore’s law the density of the circuits which are fabr...
The scaling process of the conventional 2D-planar metal-oxide semiconductor field-effect transistor ...
In the world of Integrated Circuits, Complementary Metal– Oxide–Semiconductor (CMOS) has lost its cr...
FinFET at 32 nm and beyond is an emerging transistor technology offer interesting delay–power trade...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
Semiconductor industry greatly depends on CMOS technology and now needs competent technology with ha...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
FinFET is a non planar modeling device for small size transistors (less than 45nm) will replace trad...
Planar Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) have been leading the semiconduc...
This paper describes the characteristics comparison of bulk FINFET and SOI FINFET. The scaling trend...
Technology scaling below 22 nm has brought several detrimental effects such as increased short chann...
Scaling of the MOSFET face greater challenge by extreme power density due to leakage current in ultr...
The processors and digital circuits designed today contain billions of transistors on a small piece ...
In this paper, we present the impact of downscaling of nano-channel dimensions of Indium Arsenide Fi...