Al2O3 thin films of different thicknesses were prepared onto clean glass substrates using ohmic aluminum electrodes. Their dielectric properties and ac conductivity have been investigated in the frequency range 0.1-100KHz and within the temperature range 100-400K. Oxide-layer thicknesses of the films range between 50-1550 angstrom. The dielectric constant epsilon(1). was found to decrease with increasing frequency and increase with temperature in the given intervals. Only ac losses have been investigated due to the smallness of dc losses. The ac conductivity satisfies the power law omega(s). Here the s parameter is in the vicinity of 0.8 and it decreases with increasing temperature. This behaviour of s can comply with CBH model. The activat...
We have investigated the effect of post- deposition annealing on the composition and electrical prop...
In this work, Al/Al 2O 3 nanocomposite thin film is deposited on Si substrate by radio frequency spu...
We report the characterization of carbonaceous aluminium oxide, $Al_2O_3$:C, films grown on Si(100) ...
Alumina (Al2O3) thin films were sputter deposited over well-cleaned glass and Si < 100 > substrates ...
A discussion of electrical properties of amorphous thin films of Al−In2O3−Al structure is presented....
A comparative electrical characterization study of aluminum oxide (Al2O3) deposited by thermal and p...
This work describes a conductance modeling of aluminum oxide (Al2O3) gates prepared by oxidation of ...
comparative electrical characterization study of aluminum oxide (Al2O3) deposited by thermal and pla...
We report detailed current-transport studies of ultrathin Al2O3 dielectrics on GaAs grown by atomic ...
International audienceThe dielectric properties of aluminium oxide (Al2O3) thin films obtained by pl...
Thin films of alumina (Al2O3) were deposited over Si < 1 0 0 > substrates at room temperature at an ...
Thin films of Al2O3 have been deposited on ITO-coated glass substrates by a sol-gel dipcoat process....
177-181DC conductivity of thin films of MoO3, prepared by activated reactive evaporation technique,...
We report the characterization of carbonaceous aluminium oxide, Al2O3:C, films grown on Si(100) by m...
Al2O3 gate dielectric thin films were deposited by reactive dc magnetron sputtering. The electrical ...
We have investigated the effect of post- deposition annealing on the composition and electrical prop...
In this work, Al/Al 2O 3 nanocomposite thin film is deposited on Si substrate by radio frequency spu...
We report the characterization of carbonaceous aluminium oxide, $Al_2O_3$:C, films grown on Si(100) ...
Alumina (Al2O3) thin films were sputter deposited over well-cleaned glass and Si < 100 > substrates ...
A discussion of electrical properties of amorphous thin films of Al−In2O3−Al structure is presented....
A comparative electrical characterization study of aluminum oxide (Al2O3) deposited by thermal and p...
This work describes a conductance modeling of aluminum oxide (Al2O3) gates prepared by oxidation of ...
comparative electrical characterization study of aluminum oxide (Al2O3) deposited by thermal and pla...
We report detailed current-transport studies of ultrathin Al2O3 dielectrics on GaAs grown by atomic ...
International audienceThe dielectric properties of aluminium oxide (Al2O3) thin films obtained by pl...
Thin films of alumina (Al2O3) were deposited over Si < 1 0 0 > substrates at room temperature at an ...
Thin films of Al2O3 have been deposited on ITO-coated glass substrates by a sol-gel dipcoat process....
177-181DC conductivity of thin films of MoO3, prepared by activated reactive evaporation technique,...
We report the characterization of carbonaceous aluminium oxide, Al2O3:C, films grown on Si(100) by m...
Al2O3 gate dielectric thin films were deposited by reactive dc magnetron sputtering. The electrical ...
We have investigated the effect of post- deposition annealing on the composition and electrical prop...
In this work, Al/Al 2O 3 nanocomposite thin film is deposited on Si substrate by radio frequency spu...
We report the characterization of carbonaceous aluminium oxide, $Al_2O_3$:C, films grown on Si(100) ...