Application of convergent beam electron diffraction to two-dimensional strain mapping in silicon devices

A method of obtaining quantitative two-dimensional (2D) maps of strain by the convergent beam electron diffraction technique in a transmission electron microscope is described. It is based on the automatic acquisition of a series of diffraction patterns generated from digital rastering the electron spot in a matrix of points within a selected area of the sample. These patterns are stored in a database and the corresponding strain tensor at each point is calculated, thus yielding a 2D strain map. An example of application of this method to cross-sectioned cells fabricated for the 0.15 mum technology of flash memories is reported