Add to ORKGDetailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser plasmas were completed using a combination of spectroscopic instruments that allow for quantitative spectroscopy throughout the radiation region of 5 nm to 550 nm. © 2008 Optical Society of America
Experimental scaling relations of the optical depth are presented for the emission spectra of a tin-...
Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been ...
Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) ...
Detailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser p...
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology...
Light sources based on laser plasmas using tin as target material are known to provide high conversi...
With the availability of high reflectivity multilayer mirrors and zone plate lenses, the EUV region ...
We have previously reported encouraging results with a new type of laser plasma source. As a radiati...
High EUV source power has been demonstrated with a laser-plasma source exhibiting low debris and hig...
Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavel...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultr...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
We present a calibrated spectrum in the 5.5-265.5 nm range from a microdroplet-tin Nd:YAG-laser-prod...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
Experimental scaling relations of the optical depth are presented for the emission spectra of a tin-...
Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been ...
Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) ...
Detailed spectroscopic studies on extreme ultra violet (EUV) emission from tin-doped droplet laser p...
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology...
Light sources based on laser plasmas using tin as target material are known to provide high conversi...
With the availability of high reflectivity multilayer mirrors and zone plate lenses, the EUV region ...
We have previously reported encouraging results with a new type of laser plasma source. As a radiati...
High EUV source power has been demonstrated with a laser-plasma source exhibiting low debris and hig...
Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavel...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultr...
Experimental spectroscopic studies are presented, in a 5.5-25.5 nm extreme-ultraviolet (EUV) wavelen...
We present a calibrated spectrum in the 5.5-265.5 nm range from a microdroplet-tin Nd:YAG-laser-prod...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
Experimental scaling relations of the optical depth are presented for the emission spectra of a tin-...
Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been ...
Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) ...