Analog Micro-Optics Fabrication By Use Of A Two-Dimensional Binary Phase-Grating Mask

The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with π phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated, The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated. © 2005 Optical Society of America