Structural and electrical properties of high-performance vanadium dioxide thin layers obtained by reactive magnetron sputtering

International audienceEpitaxial vanadium dioxide (VO2) films exhibiting an abrupt metal-insulator transition with resistivity ratios of five orders of magnitude have been grown on (001)-oriented sapphire substrates by reactive magnetron sputtering. The influence of deposition and annealing temperature on the structure and morphology of the layers are discussed as well as their impact on the films’ electrical properties. Thus, the VO2 layers obtained using the optimal experimental conditions have electrical resistivity ratios over 105 and can be obtained on substrates as large as three-inch in diameter. The combination of the scalability of magnetron sputtering and the high quality of the films enables the large-scale industrial applications of high quality VO2 layer