Hard coatings like titanium nitride (TiN) normally contain a high degree of internal stress (usually compressive in-plane parallel with the surface) owing to growth defects developed during the deposition process and thermal mismatch effects after final cooling; it is, therefore, difficult to produce single-layer TiN coatings thicker than 6-7 mu m, without adhesion problems. In the present study, thick coatings (i.e. > 10 mu m) have been achieved by alternate multilayering of TiN with Ti interlayers, leading to a tougher and less-stressed film. However, having a constant distribution of titanium interlayer thickness is not necessarily the best solution to achieve maximum performance in terms of wear resistance and hardness. The residual str...
TiN/(Ti,Al)N multilayer coatings prepared by physical vapour deposition onto steel Substrates were S...
The fabrication of titanium nitride (TiN) thin films with varying thicknesses by reactive magnetron ...
[[abstract]]Titanium nitride (TiN) film was deposited on 304 stainless steel using a hollow cathode ...
Hard coatings like titanium nitride (TiN) normally contain a high degree of internal stress (usually...
Multilayer systems can offer an efficient way of controlling residual stress, improve adhesion and e...
Residual stresses in the PVD-coatings usually deteriorate the adhesion of coatings and adversely aff...
TiN multilayers that alternate with either titanium (ductile) or nanocomposite TiSiN (hard) interlay...
Mono- and multiple TiN(/Ti) coatings deposited on Ti-13Nb-13Zr alloy substrates by the filtered arc ...
[[abstract]]TiN films are prepared on low carbon steel with a titanium interlayer by reactive RF pla...
Although titanium nitride is used as a hard protective coating, it is brittle. The multilayering of ...
The mechanical and tribological behavior of physical vapor deposited coatings on soft substrate mate...
TiCN coatings on the market today are in general multi-layer TiN/ Ti(CxN1-x) coatings. Such multilay...
Two PVD titanium nitride based coatings; monolayer TiN and multilayer resulting from the stacking of...
Most functional microelectronic devices as well as hard coatings use brittle ceramics like Titanium ...
Two PVD titanium nitride based coatings; monolayer TiN and multilayer resulting from the stacking of...
TiN/(Ti,Al)N multilayer coatings prepared by physical vapour deposition onto steel Substrates were S...
The fabrication of titanium nitride (TiN) thin films with varying thicknesses by reactive magnetron ...
[[abstract]]Titanium nitride (TiN) film was deposited on 304 stainless steel using a hollow cathode ...
Hard coatings like titanium nitride (TiN) normally contain a high degree of internal stress (usually...
Multilayer systems can offer an efficient way of controlling residual stress, improve adhesion and e...
Residual stresses in the PVD-coatings usually deteriorate the adhesion of coatings and adversely aff...
TiN multilayers that alternate with either titanium (ductile) or nanocomposite TiSiN (hard) interlay...
Mono- and multiple TiN(/Ti) coatings deposited on Ti-13Nb-13Zr alloy substrates by the filtered arc ...
[[abstract]]TiN films are prepared on low carbon steel with a titanium interlayer by reactive RF pla...
Although titanium nitride is used as a hard protective coating, it is brittle. The multilayering of ...
The mechanical and tribological behavior of physical vapor deposited coatings on soft substrate mate...
TiCN coatings on the market today are in general multi-layer TiN/ Ti(CxN1-x) coatings. Such multilay...
Two PVD titanium nitride based coatings; monolayer TiN and multilayer resulting from the stacking of...
Most functional microelectronic devices as well as hard coatings use brittle ceramics like Titanium ...
Two PVD titanium nitride based coatings; monolayer TiN and multilayer resulting from the stacking of...
TiN/(Ti,Al)N multilayer coatings prepared by physical vapour deposition onto steel Substrates were S...
The fabrication of titanium nitride (TiN) thin films with varying thicknesses by reactive magnetron ...
[[abstract]]Titanium nitride (TiN) film was deposited on 304 stainless steel using a hollow cathode ...