A novel one-dimensional array of photodetectors for the near infrared up to 1.55 mu m is reported. The device is based on polycrystalline Ge thermally evaporated on silicon, and consists of 16 pixels at a 100 mu m pitch. A responsivity of 16 mA/W was measured at 1.3 mu m with nanosecond response time
We report on the state of the art of near infrared photodetectors based on germanium on silicon. Aft...
We demonstrate novel near-infrared waveguide photodetectors in polycrystalline germanium deposited o...
Germanium is considered the most suitable semiconductor for monolithic integration of near-infrared ...
A novel one-dimensional array of photodetectors for the near infrared up to 1.55 mu m is reported. T...
The fabrication and characterization of near infrared photodetectors integrated on silicon substrate...
We review our recent results on Ge-based near-infrared photodetectors grown on silicon. We fabricate...
We review our recent results on Ge-based near-infrared photodetectors grown on silicon. We fabricate...
The authors demonstrate a two-dimensional array of Si-integrated photodetectors equipped with readou...
We report the fabrication of e cient near-infrared photodetectors based on polycrystalline Ge ® lms...
In recent years, several Ge-on-Si technologies for the fabrication of near infrared photodetectors o...
Using a low-temperature technology for polycrystalline Ge deposition, we report on the monolithic in...
We report on a novel solid-state spectrum analyzer in the near infrared. The device is an array of s...
In the past two decades SiGe has been the material of choice for the realization of near infrared (N...
In recent years, several Ge-on-Si technologies for the fabrication of near infrared photodetectors o...
We report on the state of the art of near infrared photodetectors based on germanium on silicon. Aft...
We demonstrate novel near-infrared waveguide photodetectors in polycrystalline germanium deposited o...
Germanium is considered the most suitable semiconductor for monolithic integration of near-infrared ...
A novel one-dimensional array of photodetectors for the near infrared up to 1.55 mu m is reported. T...
The fabrication and characterization of near infrared photodetectors integrated on silicon substrate...
We review our recent results on Ge-based near-infrared photodetectors grown on silicon. We fabricate...
We review our recent results on Ge-based near-infrared photodetectors grown on silicon. We fabricate...
The authors demonstrate a two-dimensional array of Si-integrated photodetectors equipped with readou...
We report the fabrication of e cient near-infrared photodetectors based on polycrystalline Ge ® lms...
In recent years, several Ge-on-Si technologies for the fabrication of near infrared photodetectors o...
Using a low-temperature technology for polycrystalline Ge deposition, we report on the monolithic in...
We report on a novel solid-state spectrum analyzer in the near infrared. The device is an array of s...
In the past two decades SiGe has been the material of choice for the realization of near infrared (N...
In recent years, several Ge-on-Si technologies for the fabrication of near infrared photodetectors o...
We report on the state of the art of near infrared photodetectors based on germanium on silicon. Aft...
We demonstrate novel near-infrared waveguide photodetectors in polycrystalline germanium deposited o...
Germanium is considered the most suitable semiconductor for monolithic integration of near-infrared ...