Add to ORKGThe Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the realization of a micro-exposure-tool and the up-grading of the National knowledge on EUV-lithography in all its aspects, from plasma sources (both high power sources and auxiliary sources for tests), debris mitigation, multilayer mirrors, and masks. The micro-exposure-tool, which is under development, will be operated at a wavelength slightly different from the international standard of 13.5 nm in order to allow the use of an innovative debris mitigation system. A novel application of EUVL to photonics is also reported
Diffraction limited 20x Schwarzschild objectives have been fabricated for various applications at 13...
Extreme ultraviolet lithography (EUVL) is the leading technology for patterning at the 32 nm technol...
EUV Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the ``0.1 {mic...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
Extreme Ultraviolet Lithography (EUVL) has emerged as one of the leading successors to optics for 0....
In this paper the authors present the EUV laboratory exposure tool in a new configuration for in-ban...
Extreme Ultraviolet Lithography (EUVL) is a promising candidate for the device fabrication at featur...
Extreme Ultraviolet Lithography (EUVL) is a promising candidate for the device fabrication at featur...
Compact, flexible laboratory sources offer advanced flexibility in developing components for EUV-lit...
While huge progress has been achieved for EUVL system design and multilayer optics during the last y...
Within a National Project on nanotechnologies, a Micro-Exposure Tool (MET) for projection lithograph...
In this work we present the capabilities of the designed and realized extreme ultraviolet laboratory...
Diffraction limited 20x Schwarzschild objectives have been fabricated for various applications at 13...
Extreme ultraviolet lithography (EUVL) is the leading technology for patterning at the 32 nm technol...
EUV Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the ``0.1 {mic...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
The Italian National Project “FIRB-EUVL” is introduced and discussed. This project includes the real...
Extreme Ultraviolet Lithography (EUVL) has emerged as one of the leading successors to optics for 0....
In this paper the authors present the EUV laboratory exposure tool in a new configuration for in-ban...
Extreme Ultraviolet Lithography (EUVL) is a promising candidate for the device fabrication at featur...
Extreme Ultraviolet Lithography (EUVL) is a promising candidate for the device fabrication at featur...
Compact, flexible laboratory sources offer advanced flexibility in developing components for EUV-lit...
While huge progress has been achieved for EUVL system design and multilayer optics during the last y...
Within a National Project on nanotechnologies, a Micro-Exposure Tool (MET) for projection lithograph...
In this work we present the capabilities of the designed and realized extreme ultraviolet laboratory...
Diffraction limited 20x Schwarzschild objectives have been fabricated for various applications at 13...
Extreme ultraviolet lithography (EUVL) is the leading technology for patterning at the 32 nm technol...
EUV Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the ``0.1 {mic...