The nucleation and growth kinetics of diamond deposited by hot-filament chemical vapour deposition (HFCVD) on Si(100) substrates, previously deformed by uniaxial compression dong the [100] direction, have been investigated Although the nucleation density at saturation (0.04-0.06 mu m(-2)) was similar to those measured on virgin, as-received Si(100) wafers, the kinetics of stable nucleus formation resembled the fast kinetics observed for substrates which were mechanically abraded prior to CVD in order to enhance diamond nucleation. The results definitely indicate that diamond nucleation occurs randomly with a rate that is a Dirac delta function. The time dependence of the substrate fraction which is covered by islands was measured, and a goo...
A diamond nucleation site responsible for epitaxial growth of diamond on silicon by chemical vapor d...
[[abstract]]Methods for seeding silicon substrates with pretreatments and the in situ generation of ...
Bias-enhanced nucleation of diamond on Si, and the following growth until a continuos film, using a ...
The nucleation and growth kinetics of diamond deposited by hot-filament chemical vapour deposition (...
The diamond nucleation and growth processes on a scratched and a virgin Si(100) surface were studied...
This paper presents a theoretical study on the initial stage of diamond nucleation during chemical v...
Diamond deposits of well-separated particles have been obtained by the hot filament CVD technique on...
On the basis of an analysis of experimental data on nucleation rates performed in the preceding pape...
Particle size distributions derived from SEM micrographs of well-separated diamond particles, deposi...
Diamond crystallites and continuous films were deposited on (100) silicon by microwave plasma assist...
The synthesis of thin diamond films using various chemical vapor deposition methods has received sig...
International audienceThe effects of the bias current density and the filament-to-substrate distance...
A diamond nucleation site responsible for epitaxial growth of diamond on silicon by chemical vapor d...
[[abstract]]Methods for seeding silicon substrates with pretreatments and the in situ generation of ...
Bias-enhanced nucleation of diamond on Si, and the following growth until a continuos film, using a ...
The nucleation and growth kinetics of diamond deposited by hot-filament chemical vapour deposition (...
The diamond nucleation and growth processes on a scratched and a virgin Si(100) surface were studied...
This paper presents a theoretical study on the initial stage of diamond nucleation during chemical v...
Diamond deposits of well-separated particles have been obtained by the hot filament CVD technique on...
On the basis of an analysis of experimental data on nucleation rates performed in the preceding pape...
Particle size distributions derived from SEM micrographs of well-separated diamond particles, deposi...
Diamond crystallites and continuous films were deposited on (100) silicon by microwave plasma assist...
The synthesis of thin diamond films using various chemical vapor deposition methods has received sig...
International audienceThe effects of the bias current density and the filament-to-substrate distance...
A diamond nucleation site responsible for epitaxial growth of diamond on silicon by chemical vapor d...
[[abstract]]Methods for seeding silicon substrates with pretreatments and the in situ generation of ...
Bias-enhanced nucleation of diamond on Si, and the following growth until a continuos film, using a ...