In this work, an effort was put to verify the usefulness of the potential step re-passivation technique in studying the stress corrosion cracking (SCC) susceptibility of copper in environments simulating the final repository of high-level nuclear waste. Validation experiments in NaNO2 solutions (0.005, 0.05 and 1.0 M) showed that the technique is applicable with certain boundary conditions. In addition, conduction mechanism of passive films on Cu in nitrites is studied with impedance spectroscopy and quantitatively modeled by the Mixed-Conduction Model for oxide films. As a result, possible correlations between electrochemically derived parameters and SCC susceptibility are found and discussed.</p
Auto-oscillations of the electrochemical potential around its average value close to +100 mVSCE unde...
During copper CMP, abrasives and asperities interact with the copper at the nano-scale, partially re...
textIn this study, the stress relaxation and electromigration behaviors of Cu/low-k interconnects w...
In this work, an effort was put to verify the usefulness of the potential step re-passivation techni...
The spent nuclear fuel is planned to be stored in steel canisters that have an outer shield made of ...
The effects of strain rate on interactions between copper and its oxide films have been studied. The...
The effects of strain rate on interactions between copper and its oxide films have been studied. The...
Stress corrosion cracking is a potential failure mechanism of the copper canister proposed to be the...
Stress corrosion cracking is a potential failure mechanism of the copper canister proposed to be the...
The corrosion inhibition behavior of sodium nitrite (NaNO2) towards pure copper (99.95%) in simulate...
Copper specimens were exposed to Sulfate-Reducing Bacteria (SRB) for 10 months under the conditions ...
Copper specimens were exposed to Sulfate-Reducing Bacteria (SRB) for 10 months under the conditions ...
The corrosion of copper in simulated deep repository conditions has been studied using thermodynamic...
In the present work two electrochemical techniques were used to study passivation of a clean copper ...
textIn this study, the stress relaxation and electromigration behaviors of Cu/low-k interconnects w...
Auto-oscillations of the electrochemical potential around its average value close to +100 mVSCE unde...
During copper CMP, abrasives and asperities interact with the copper at the nano-scale, partially re...
textIn this study, the stress relaxation and electromigration behaviors of Cu/low-k interconnects w...
In this work, an effort was put to verify the usefulness of the potential step re-passivation techni...
The spent nuclear fuel is planned to be stored in steel canisters that have an outer shield made of ...
The effects of strain rate on interactions between copper and its oxide films have been studied. The...
The effects of strain rate on interactions between copper and its oxide films have been studied. The...
Stress corrosion cracking is a potential failure mechanism of the copper canister proposed to be the...
Stress corrosion cracking is a potential failure mechanism of the copper canister proposed to be the...
The corrosion inhibition behavior of sodium nitrite (NaNO2) towards pure copper (99.95%) in simulate...
Copper specimens were exposed to Sulfate-Reducing Bacteria (SRB) for 10 months under the conditions ...
Copper specimens were exposed to Sulfate-Reducing Bacteria (SRB) for 10 months under the conditions ...
The corrosion of copper in simulated deep repository conditions has been studied using thermodynamic...
In the present work two electrochemical techniques were used to study passivation of a clean copper ...
textIn this study, the stress relaxation and electromigration behaviors of Cu/low-k interconnects w...
Auto-oscillations of the electrochemical potential around its average value close to +100 mVSCE unde...
During copper CMP, abrasives and asperities interact with the copper at the nano-scale, partially re...
textIn this study, the stress relaxation and electromigration behaviors of Cu/low-k interconnects w...