A new test methodology for the analysis of SEE in power MOSFET is presented. It is based on the combined use of an Ion Electron Emission Microscope (IEEM) and an experimental set-up which is able to acquire the drain signals associated to the impacts during the irradiation. The charge generation sensitivity map of a 200 V power MOSFET has been measured. It indicates the areas where the impacting particles generate the maximum charge. This map is strictly correlated with the sensitivity map of the device to SEB
In recent years, a lot of research has been carried out into voltage contrast which is now widely us...
An ion electron emission microscope (IEEM) to be installed at the SIRAD heavy ion irradiation facili...
Almost every space mission uses vertical power metal-semiconductor-oxide field-effect transistors (M...
A new test methodology for the analysis of SEE in power MOSFET is presented. It is based on the comb...
GANIL/Applications industriellesThe effects of heavy-ion test conditions and beam energy on device r...
It is essential to characterize power MosFETs regarding their tolerance to destructive Single Event ...
High-frequency semiconductor devices are key components for advanced power electronic syste...
When an energetic ion strikes a microelectronic device it induces current transients that may lead t...
This paper presents the threshold voltage shifts for both p-channel and n-channel commercial power M...
Ion Electron Emission Microscopy (IEEM) can provide an alternative approach to microbeams for microm...
We have investigated the radiation effect on MOSFET performances due to the incidence of a few ions ...
The mechanisms responsible for single event upsets can be studied more realistically in transistors ...
This paper presents experimental data showing heavy ions inducing gate degradation in power MOSFETs....
Radiation effect microscopy (REM) describes two related areas of research that are used to study sem...
The single event upset (SEU) imaging has been applied at the GSI heavy ion microprobe to determine t...
In recent years, a lot of research has been carried out into voltage contrast which is now widely us...
An ion electron emission microscope (IEEM) to be installed at the SIRAD heavy ion irradiation facili...
Almost every space mission uses vertical power metal-semiconductor-oxide field-effect transistors (M...
A new test methodology for the analysis of SEE in power MOSFET is presented. It is based on the comb...
GANIL/Applications industriellesThe effects of heavy-ion test conditions and beam energy on device r...
It is essential to characterize power MosFETs regarding their tolerance to destructive Single Event ...
High-frequency semiconductor devices are key components for advanced power electronic syste...
When an energetic ion strikes a microelectronic device it induces current transients that may lead t...
This paper presents the threshold voltage shifts for both p-channel and n-channel commercial power M...
Ion Electron Emission Microscopy (IEEM) can provide an alternative approach to microbeams for microm...
We have investigated the radiation effect on MOSFET performances due to the incidence of a few ions ...
The mechanisms responsible for single event upsets can be studied more realistically in transistors ...
This paper presents experimental data showing heavy ions inducing gate degradation in power MOSFETs....
Radiation effect microscopy (REM) describes two related areas of research that are used to study sem...
The single event upset (SEU) imaging has been applied at the GSI heavy ion microprobe to determine t...
In recent years, a lot of research has been carried out into voltage contrast which is now widely us...
An ion electron emission microscope (IEEM) to be installed at the SIRAD heavy ion irradiation facili...
Almost every space mission uses vertical power metal-semiconductor-oxide field-effect transistors (M...