Random telegraph signal (RTS) fluctuations with relative amplitude up to 50% are observed in forward and reverse gate current of unstressed and reverse-bias-stressed AlGaN/GaN high electron mobility transistors. Measurements of RTS amplitude and mean pulse widths as a function of forward gate bias indicate that the RTS is due to modulation of current along an intrinsic or stress-induced percolation path across the AlGaN-barrier by electron capture and emission on a trap within the barrier. Processes of electron capture from GaN to trap and subsequent tunneling to metal gate or electron exchange between GaN channel and the trap are considered. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3701164
This study investigates degradation of gallium nitride (GaN) high-electron mobility transistor (HEMT...
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International audienceGaN based transistors' performance and reliability status are largely sensitiv...
This study investigates degradation of gallium nitride (GaN) high-electron mobility transistor (HEMT...
Low frequency noise was measured in silicon MOSFET and GaN and InGaAs based HFET devices with specia...
This paper describes an investigation of the effect of reverse-bias stress on the leakage current an...
Random telegraph noise (RTN) and pre-breakdown bursts in gate current are studied in time domain in ...
Properties of stress-induced percolation paths in AlGaN in step-stressed AlGaN/GaN high electron mob...
In this contribution we investigate in time domain pre-breakdown current fluctuations during the dev...
It is known that flicker noise is the most intriguing noise component because it can be found in any...
The random telegraph noise (RTN) of tunnel field-effect transistors (TFETs) has been investigated. I...
International audienceNitride technologies are widely used for high frequency and high power electro...
Gate dielectric traps are becoming a major concern in the high-k/metal gate devices. In this paper, ...
In this brief, traps-related dispersion phenomena are investigated on GaN/AlGaN MOS-high-electron mo...
We present an extensive analysis of the trapping processes induced by drain bias stress in AlGaN/GaN...
Gate dielectric traps are becoming a major concern in the high-k/metal gate devices. In this paper, ...
In this work, the threshold voltage instability of normally-off p-GaN high electron mobility transis...
International audienceGaN based transistors' performance and reliability status are largely sensitiv...
This study investigates degradation of gallium nitride (GaN) high-electron mobility transistor (HEMT...
Low frequency noise was measured in silicon MOSFET and GaN and InGaAs based HFET devices with specia...
This paper describes an investigation of the effect of reverse-bias stress on the leakage current an...