Failure modes of bipolar Schottky logic devices due to metallurgical degradation of PtSi/Ti-W/Al contacts were studied. Both to the purpose prepared wafers and commercial 74LSOO TTL Low-Power Schottky devices were used. Metallurgical failures are primarily due to Al diffusion through the Ti-W barrier layer. As a consequence, thermal treatments induce electrical failures which begin with a loss of fan-out followed by longer rise and fall switching times. Finally complete device failure is observed when the output stays always at the high logic level. Emitter-base leakages and short-circuits, due to Si dissolution in the overlaying metal system, can explain the observed electrical degradations which are markedly delayed by a thin oxygen layer...
The effect of surface treatment on electrical characteristics of aluminum-silicon contacts has been ...
In this work, the breakdown transients of metal-oxide-semiconductors (MOS) stacks with InGaAs channe...
Failure of A1-SiQSi MOS capacitors operated at elevated temperatures was studied. The time required ...
Failure modes of bipolar Schottky logic devices due to metallurgical degradation of PtSi/Ti-W/Al con...
Metallurgical and electrical failure mechanisms of the PtSi- Ti/W-Al metal system were investigated ...
The study describes the consequences of interdiffusione effects, compound formation and Schottky b...
Degradation of n-Si/PtSi/(Ti-W)/Al Schottky contacts was observed for thermal treatments at 500\u201...
Reliability of ECL 100k devices using Al (4%wt Cu, 1%wt Si) double level metallization, isoplanar te...
An analysis of the possible failure modes of TTL-LS was carried out, with particular emphasis on lon...
In this work we analyze degradation phenomena observed in pseudomorphic AlGaAs/lnGaAs HEMTs with Al/...
Emitter Coupled Logic circuits, based on bipolar transistors are extremely fast but involve very hig...
An analysis of the cause of failure has been carried out on a batch of circuits rejected in TTL (wi...
Failure mechanisms due to metallurgical interactions have been investigated in commercially availabl...
International audienceThe long-term reliability of power devices for applications in the automotive ...
This paper is a thorough overview on polysilicon bipolar junction transistors' (BJTs) reliability, w...
The effect of surface treatment on electrical characteristics of aluminum-silicon contacts has been ...
In this work, the breakdown transients of metal-oxide-semiconductors (MOS) stacks with InGaAs channe...
Failure of A1-SiQSi MOS capacitors operated at elevated temperatures was studied. The time required ...
Failure modes of bipolar Schottky logic devices due to metallurgical degradation of PtSi/Ti-W/Al con...
Metallurgical and electrical failure mechanisms of the PtSi- Ti/W-Al metal system were investigated ...
The study describes the consequences of interdiffusione effects, compound formation and Schottky b...
Degradation of n-Si/PtSi/(Ti-W)/Al Schottky contacts was observed for thermal treatments at 500\u201...
Reliability of ECL 100k devices using Al (4%wt Cu, 1%wt Si) double level metallization, isoplanar te...
An analysis of the possible failure modes of TTL-LS was carried out, with particular emphasis on lon...
In this work we analyze degradation phenomena observed in pseudomorphic AlGaAs/lnGaAs HEMTs with Al/...
Emitter Coupled Logic circuits, based on bipolar transistors are extremely fast but involve very hig...
An analysis of the cause of failure has been carried out on a batch of circuits rejected in TTL (wi...
Failure mechanisms due to metallurgical interactions have been investigated in commercially availabl...
International audienceThe long-term reliability of power devices for applications in the automotive ...
This paper is a thorough overview on polysilicon bipolar junction transistors' (BJTs) reliability, w...
The effect of surface treatment on electrical characteristics of aluminum-silicon contacts has been ...
In this work, the breakdown transients of metal-oxide-semiconductors (MOS) stacks with InGaAs channe...
Failure of A1-SiQSi MOS capacitors operated at elevated temperatures was studied. The time required ...