SEM stroboscopic voltage contrast techniques allow one to observe with high voltage resolution the temporal and spatial evolution of latch-up phenomena from the firing event to the final condition. In particular, the authors show by means of an example that in a CMOS IC the firing point may be different from the latch-up site in steady state. Only dynamic observations, therefore, allow a complete understanding of latch-up phenomena and an effective correction of IC layout
The scanning electron microscopy (SEM) technique for the study of the local sensitivity to latch-up ...
The paper describes techniques for the identification of parasitic paths leading to latch-up in CMOS...
Anomalous effects in electrical latch-up characteristics have been identified both in the d.c. (hyst...
SEM stroboscopic voltage contrast techniques allow one to observe with high voltage resolution the t...
The latch-up phenomenon in CMOS ICs is studied by means of a SEM observation technique that is based...
The latch-up phenomenon in CMOS ICs is studied by means of a SEM observation technique that is based...
The Digital Differential Voltage Contrast in a SEM has been applied to the observation of the latch-...
The paper demonstrates some techniques for the localization of parasitic paths responsible for the l...
An electron beam testing system has been developed for complete and detailed analysis of latchup in ...
One of the most hazardous reliability problems for CMOS IC's is due to the latch-up failure mechanis...
An electron beam testing system was established for a complete and detailed analysis of latch-up in ...
Custom CMOS ICs are very attractive for automotive applications; in the tough automotive environment...
The main purpose of this project is to study the latchup phenomenon in submicrometer CMOS devices an...
A technique is presented for using the scanning electron microscope (SEM) in the electron-beam-induc...
An analysis of three-dimensional (3-D) effects in CMOS latchup under dynamic conditions that expands...
The scanning electron microscopy (SEM) technique for the study of the local sensitivity to latch-up ...
The paper describes techniques for the identification of parasitic paths leading to latch-up in CMOS...
Anomalous effects in electrical latch-up characteristics have been identified both in the d.c. (hyst...
SEM stroboscopic voltage contrast techniques allow one to observe with high voltage resolution the t...
The latch-up phenomenon in CMOS ICs is studied by means of a SEM observation technique that is based...
The latch-up phenomenon in CMOS ICs is studied by means of a SEM observation technique that is based...
The Digital Differential Voltage Contrast in a SEM has been applied to the observation of the latch-...
The paper demonstrates some techniques for the localization of parasitic paths responsible for the l...
An electron beam testing system has been developed for complete and detailed analysis of latchup in ...
One of the most hazardous reliability problems for CMOS IC's is due to the latch-up failure mechanis...
An electron beam testing system was established for a complete and detailed analysis of latch-up in ...
Custom CMOS ICs are very attractive for automotive applications; in the tough automotive environment...
The main purpose of this project is to study the latchup phenomenon in submicrometer CMOS devices an...
A technique is presented for using the scanning electron microscope (SEM) in the electron-beam-induc...
An analysis of three-dimensional (3-D) effects in CMOS latchup under dynamic conditions that expands...
The scanning electron microscopy (SEM) technique for the study of the local sensitivity to latch-up ...
The paper describes techniques for the identification of parasitic paths leading to latch-up in CMOS...
Anomalous effects in electrical latch-up characteristics have been identified both in the d.c. (hyst...