Different Fe implantation schemes in n-doped InP have been used in order to create semi-insulating layers with the desired characteristics. The electrical properties of these structures have been investigated by means of current-voltage measurements and deep level analyses; compensation of n-doping up to 10^19 cm^-3 has been verified. Electroluminescence emission has also been obtained from the compensated samples with the highest substrate doping concentration up to the temperature of 260 K
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
Properties of Fe-doped semi-insulating (SI) InP with different iron concentrations are studied by us...
Different Fe implantation schemes in n-doped InP have been used in order to create semi-insulating l...
A detailed study of Fe implantation and damage annealing in indium phosphide is presented. The techn...
High temperature (> 200 degreesC) Fe implantation in InP has been proved to be a suitable method to ...
The Fe-related properties in high-temperature Fe implanted and annealed InP were studied by means of...
High temperature (> 200 degreesC) Fe ion implantation in combination with a post-implantation anneal...
The structural and electrical characteristic properties of high temperature Fe implantation in InP, ...
The measurement of photoconductivity in samples of semi-insulating n-type Fe-doped InP are reported....
It has recently been reported that high-resistivity Fe-doped InP wafers can present very different c...
Properties of Fe-doped semi-insulating (SI) InP with different iron concentration are studied by usi...
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
As-cut InP wafers with residual carrier concentration < 5 x 10(15) cm(-3), submitted to Fe-diffusion...
High-energy implantation of iron in n-type doped InP epilayers at different substrate temperatures: ...
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
Properties of Fe-doped semi-insulating (SI) InP with different iron concentrations are studied by us...
Different Fe implantation schemes in n-doped InP have been used in order to create semi-insulating l...
A detailed study of Fe implantation and damage annealing in indium phosphide is presented. The techn...
High temperature (> 200 degreesC) Fe implantation in InP has been proved to be a suitable method to ...
The Fe-related properties in high-temperature Fe implanted and annealed InP were studied by means of...
High temperature (> 200 degreesC) Fe ion implantation in combination with a post-implantation anneal...
The structural and electrical characteristic properties of high temperature Fe implantation in InP, ...
The measurement of photoconductivity in samples of semi-insulating n-type Fe-doped InP are reported....
It has recently been reported that high-resistivity Fe-doped InP wafers can present very different c...
Properties of Fe-doped semi-insulating (SI) InP with different iron concentration are studied by usi...
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
As-cut InP wafers with residual carrier concentration < 5 x 10(15) cm(-3), submitted to Fe-diffusion...
High-energy implantation of iron in n-type doped InP epilayers at different substrate temperatures: ...
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
We have investigated the structural and electrical behavior of Fe centers introduced in InP by high ...
Properties of Fe-doped semi-insulating (SI) InP with different iron concentrations are studied by us...