In this work the Si self-interstitial-carbon interaction has been experimentally investigated and modeled. The interactions between self-interstitials, produced by 20-keV silicon implantation, and substitutional carbon in silicon have been studied using a Si 1-yC y layer grown by molecular beam epitaxy (MBE) and interposed between the near-surface self-interstitial source and a deeper B spike used as a marker for the Si-interstitial concentration. The C atoms, all incorporated in substitutional sites and with a C-dose range of 7 7 10 12-4 7 10 14 atoms/cm 2, trap the self-interstitials in such a manner that the Si 1-yC y layer behaves as a filtering membrane for the interstitials flowing towards the bulk and, consequently, strongly reduce...
In the same way that gases react with surfaces from above, solid-state point defects such as interst...
Carbon constitutes a significant defect in silicon (Si) as it can interact with intrinsic point defe...
Carbon is an important defect in silicon (Si) as it can interact with intrinsic point defects and af...
In this work the diffusion of ion-beam-injected self-interstitials (Is) and their interaction with i...
The carbon-mediated aggregation of silicon self-interstitials is investigated with a novel approach ...
By combining model-potential molecular-dynamics simulations and ab initio calculations we investigat...
By combining model-potential molecular-dynamics simulations and ab initio calculations we investigat...
The carbon-mediated aggregation of silicon self-interstitials is investigated with a novel approach ...
In this work a rate equations model describing the interstitials (I) diffusion in a trap containing ...
Carbon-Mediated Aggregation of Self-Interstitials in Silicon The carbon-mediated aggregation of sili...
New findings on the self-interstitial migration in p-type silicon are presented. They are based on e...
DLTS studies of transformation kinetics of different carbon–related complexes in electron irradiated...
In this work the silicon self-interstitial (I) diffusion in trap-containing molecular beam epitaxy S...
cited By 2International audienceH implantation results in the appearance of tensile out-of-plane str...
cited By 2International audienceH implantation results in the appearance of tensile out-of-plane str...
In the same way that gases react with surfaces from above, solid-state point defects such as interst...
Carbon constitutes a significant defect in silicon (Si) as it can interact with intrinsic point defe...
Carbon is an important defect in silicon (Si) as it can interact with intrinsic point defects and af...
In this work the diffusion of ion-beam-injected self-interstitials (Is) and their interaction with i...
The carbon-mediated aggregation of silicon self-interstitials is investigated with a novel approach ...
By combining model-potential molecular-dynamics simulations and ab initio calculations we investigat...
By combining model-potential molecular-dynamics simulations and ab initio calculations we investigat...
The carbon-mediated aggregation of silicon self-interstitials is investigated with a novel approach ...
In this work a rate equations model describing the interstitials (I) diffusion in a trap containing ...
Carbon-Mediated Aggregation of Self-Interstitials in Silicon The carbon-mediated aggregation of sili...
New findings on the self-interstitial migration in p-type silicon are presented. They are based on e...
DLTS studies of transformation kinetics of different carbon–related complexes in electron irradiated...
In this work the silicon self-interstitial (I) diffusion in trap-containing molecular beam epitaxy S...
cited By 2International audienceH implantation results in the appearance of tensile out-of-plane str...
cited By 2International audienceH implantation results in the appearance of tensile out-of-plane str...
In the same way that gases react with surfaces from above, solid-state point defects such as interst...
Carbon constitutes a significant defect in silicon (Si) as it can interact with intrinsic point defe...
Carbon is an important defect in silicon (Si) as it can interact with intrinsic point defects and af...