InGaAsP/InP micro-waveguides are fabricated by a deep (>3 μm) Reactive Ion Etching. The devices losses are measured by the Fabry–Perot technique for guide width contained between 10 μm and 0.5 μm. The measured losses range from 2 dB/mm to 14 dB/mm
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
InGaAsP/InP micro-waveguides are fabricated by a deep (>3 μm) Reactive Ion Etching. The devices loss...
InGaAsP/InP micro-waveguides are fabricated by a deep (>3 μm) Reactive Ion Etching. The devices loss...
International audienceThe fabrication and characterisation of low-loss InGaAsP/InP optical submicron...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Smooth and vertical sidewalls ridge waveguides are essential for applications in photonic circuits. ...
We have fabricated high-quality planar photonic crystal defect waveguides in InP/InGaAsP material. U...
We have fabricated high-quality planar photonic crystal defect waveguides in InP/InGaAsP material. U...
Electron Cyclotron Resonance (ECR) reactive ion etching of InP-based waveguide structures was studie...
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
InGaAsP/InP micro-waveguides are fabricated by a deep (>3 μm) Reactive Ion Etching. The devices loss...
InGaAsP/InP micro-waveguides are fabricated by a deep (>3 μm) Reactive Ion Etching. The devices loss...
International audienceThe fabrication and characterisation of low-loss InGaAsP/InP optical submicron...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
Smooth and vertical sidewalls ridge waveguides are essential for applications in photonic circuits. ...
We have fabricated high-quality planar photonic crystal defect waveguides in InP/InGaAsP material. U...
We have fabricated high-quality planar photonic crystal defect waveguides in InP/InGaAsP material. U...
Electron Cyclotron Resonance (ECR) reactive ion etching of InP-based waveguide structures was studie...
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching....
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