As standard concepts for precision positioning within a machine reach their limits with increasing measurement volumes, inverse concepts are a promising approach for addressing this problem. The inverse principle entails other limitations, as for high-precision positioning of a sensor head within a large measurement volume, three four-beam interferometers are required in order to measure all necessary translations and rotations of the sensor head and reconstruct the topography of the reference system consisting of fixed mirrors in the x-, y-, and z-directions. We present the principle of a passive heterodyne laser interferometer with consequently separated beam paths for the individual heterodyne frequencies. The beam path design is illustr...
International audienceWe present an application of a quadrature phase interferometer to the measurem...
Development in industry is asking for improved resolution and higher accuracy in mechanical measurem...
A method capable of delivering relative optical path length metrology with nanometer precision is de...
As standard concepts for precision positioning within a machine reach their limits with increasing m...
A heterodyne interferometer and a data acquiring algorithm have been developed to measure the moveme...
In order to achieve nanometer accuracy, metrologists need to identify the sources of error...
[[abstract]]A laser interferometer system based on three design principles, the heterodyne frequency...
Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate pos...
We present here the design, implementation and characterization of a heterodyne laser interferometer...
This paper presents a novel methodology for position and orientation (pose) measurement of stages us...
We have proposed an improved heterodyne interferometric roll measurement system with enhanced resolu...
A control system strives to maintain the correct alignment of a laser beam in an interferometer dedi...
We present the design, implementation, and characterization of a heterodyne laser interferometer fo...
The integrated circuit industry builds integrated circuits (IC’s) by placing many layers of semi con...
[[abstract]]©2005 SPIE - The interferometers which measure the displacement parallel to the measurem...
International audienceWe present an application of a quadrature phase interferometer to the measurem...
Development in industry is asking for improved resolution and higher accuracy in mechanical measurem...
A method capable of delivering relative optical path length metrology with nanometer precision is de...
As standard concepts for precision positioning within a machine reach their limits with increasing m...
A heterodyne interferometer and a data acquiring algorithm have been developed to measure the moveme...
In order to achieve nanometer accuracy, metrologists need to identify the sources of error...
[[abstract]]A laser interferometer system based on three design principles, the heterodyne frequency...
Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate pos...
We present here the design, implementation and characterization of a heterodyne laser interferometer...
This paper presents a novel methodology for position and orientation (pose) measurement of stages us...
We have proposed an improved heterodyne interferometric roll measurement system with enhanced resolu...
A control system strives to maintain the correct alignment of a laser beam in an interferometer dedi...
We present the design, implementation, and characterization of a heterodyne laser interferometer fo...
The integrated circuit industry builds integrated circuits (IC’s) by placing many layers of semi con...
[[abstract]]©2005 SPIE - The interferometers which measure the displacement parallel to the measurem...
International audienceWe present an application of a quadrature phase interferometer to the measurem...
Development in industry is asking for improved resolution and higher accuracy in mechanical measurem...
A method capable of delivering relative optical path length metrology with nanometer precision is de...