The influence of plasma on the morphological and structural properties of TiO2 thin films

Uniform and dense titanium dioxide (TiO2) thin films, required in several fields, can be achieved by using standard deposition. Here, we investigate the effect of using a plasma source during e-beam deposition on the morphological and structural properties of TiO2 thin films. We show that morphology, crystallization onset temperature, and crystallization evolution are all affected by the change in material density, achieved by employing or not plasma bombardment