Add to ORKGThe question of the nature and charge of the metallic particles emitted in cathode sputtering has been answered experimentally: the particles are primarily neutral atoms. The proof was obtained from the moving particles themselves by a new "spectroscopic method of vapor pressure measurement" in combination with a "vapor pressure measurement from coating density.
A low inductance circuit was designed, built and employed for the evaporation of metal wires with su...
Abstract: Direct measurements and Monte Carlo simulations of the energy distribution of energetic ne...
We calculate the rate at which a target located at the cathode of a glow discharge is sputtered. The...
On the specificity of phenomena, occurring in the case of cathodes of low conductivity, the article ...
When metal is deposited cathodically upon a glass plate a film is found upon the side of the plate a...
Abstract. Mass spectroscopic studies of the neutral particles puttered by Ar + ions at 8 keV from po...
The energy distributions of sputtered atoms and ions produced by few hundred to few thousand eV ion ...
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
Sputter deposition is an important technology, which is widely used in the production of thin films ...
The pumping performances for noble gases of several sputter-ion pumps have been investigated, focuss...
Forces on a small plane measurement target caused by sputtered atomic particles originated...
A low inductance circuit was designed, built and employed for the evaporation of metal wires with su...
A brief review is given of recent progress toward a quantitative understanding of negative ion forma...
Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretic...
Thin-film deposition by sputtering is a process belonging to the family of physical vapor deposition...
A low inductance circuit was designed, built and employed for the evaporation of metal wires with su...
Abstract: Direct measurements and Monte Carlo simulations of the energy distribution of energetic ne...
We calculate the rate at which a target located at the cathode of a glow discharge is sputtered. The...
On the specificity of phenomena, occurring in the case of cathodes of low conductivity, the article ...
When metal is deposited cathodically upon a glass plate a film is found upon the side of the plate a...
Abstract. Mass spectroscopic studies of the neutral particles puttered by Ar + ions at 8 keV from po...
The energy distributions of sputtered atoms and ions produced by few hundred to few thousand eV ion ...
The deposition of films under normal and off-normal angle of incidence has been investigated to show...
Sputter deposition is an important technology, which is widely used in the production of thin films ...
The pumping performances for noble gases of several sputter-ion pumps have been investigated, focuss...
Forces on a small plane measurement target caused by sputtered atomic particles originated...
A low inductance circuit was designed, built and employed for the evaporation of metal wires with su...
A brief review is given of recent progress toward a quantitative understanding of negative ion forma...
Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretic...
Thin-film deposition by sputtering is a process belonging to the family of physical vapor deposition...
A low inductance circuit was designed, built and employed for the evaporation of metal wires with su...
Abstract: Direct measurements and Monte Carlo simulations of the energy distribution of energetic ne...
We calculate the rate at which a target located at the cathode of a glow discharge is sputtered. The...