Add to ORKGThe formation of anodic films on valve metals alloys has been studied as a function of alloy composition and anodizing conditions. Photocurrent Spectroscopy technique (PCS) has been used to determine the band gap (E g) and the flat band potential (Vfb,) of oxides grown on these alloys. The formation of insulating-like or semiconducting oxide films has been evidenced as a function of initial alloys composition. The composition of "mixed oxide" has been related to the measured optical band gap values on the basis of experimental results and previous proposed correlation
Anodic films of different thickness (∼30 nm and 70 nm) were grown by anodizing sputtering-deposited ...
The anodic behaviour of two titanium cast alloys, obtained by fusion in a voltaic arc under argon at...
Anodic films of different thickness (∼30. nm and 70. nm) were grown by anodizing sputtering-deposite...
The formation of anodic films on valve metals alloys has been studied as a function of alloy composi...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
The anodic behaviour of cast Ti-Mo alloys, having different Mo contents (6-20 wt.%), was investigate...
The anodic behaviour of cast Ti–Mo alloys, having different Mo contents (6–20 wt.%), was investigate...
The anodic behaviour of cast Ti\u2013Mo alloys, having different Mo contents (6\u201320 wt.%), was i...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
Vita.Anodic oxide films are used extensively in a variety of applications. This study focuses on cha...
Vita.Anodic oxide films are used extensively in a variety of applications. This study focuses on cha...
Anodic films of different thickness (∼30. nm and 70. nm) were grown by anodizing sputtering-deposite...
The anodic behaviour of two titanium cast alloys, obtained by fusion in a voltaic arc under argon at...
Anodic films of different thickness (∼30 nm and 70 nm) were grown by anodizing sputtering-deposited ...
The anodic behaviour of two titanium cast alloys, obtained by fusion in a voltaic arc under argon at...
Anodic films of different thickness (∼30. nm and 70. nm) were grown by anodizing sputtering-deposite...
The formation of anodic films on valve metals alloys has been studied as a function of alloy composi...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
The anodic behaviour of cast Ti-Mo alloys, having different Mo contents (6-20 wt.%), was investigate...
The anodic behaviour of cast Ti–Mo alloys, having different Mo contents (6–20 wt.%), was investigate...
The anodic behaviour of cast Ti\u2013Mo alloys, having different Mo contents (6\u201320 wt.%), was i...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
The photoelectrochemical behavior of anodic films on Al alloys, containing titanium, tantalum, and t...
Vita.Anodic oxide films are used extensively in a variety of applications. This study focuses on cha...
Vita.Anodic oxide films are used extensively in a variety of applications. This study focuses on cha...
Anodic films of different thickness (∼30. nm and 70. nm) were grown by anodizing sputtering-deposite...
The anodic behaviour of two titanium cast alloys, obtained by fusion in a voltaic arc under argon at...
Anodic films of different thickness (∼30 nm and 70 nm) were grown by anodizing sputtering-deposited ...
The anodic behaviour of two titanium cast alloys, obtained by fusion in a voltaic arc under argon at...
Anodic films of different thickness (∼30. nm and 70. nm) were grown by anodizing sputtering-deposite...