We investigate the memory function at room temperature in devices based on quantum dots. By Low Pressure Chemical Vapour Deposition (LPCVD) we deposited Si dots embedded in SiO2. On these devices flat band voltage shifts were well detected at low write voltages for write times of the order of milliseconds, and furthermore, a plateau in the flat band voltage shift, maybe consequence of Coulomb blockdale, was observed
Hole emission processes from self-organized GaAs(0.4)Sb(0.6)/GaAs quantum dots embedded in a p-n dio...
To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon rich oxide (SR...
Сharge trapping in self-aligned single-dot memory devices fabricated by UCL technology based on arse...
Silicon quantum dots have been deposited on top of a 3-nm tunnel oxide by Low Pressure Chemical Vapo...
A study was conducted on metal-oxide-semiconductor (MOS) capacitor and transistor (MOSFET) structure...
To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon-rich oxide (SR...
Nanometer-size Si quantum dots (Si-QDs) with and without Ge core were prepared on thermally-grown Si...
We have realized silicon quantum dots embedded in SiO2 which act as nano-floating gates of MOS memor...
This dissertation presents novel quantum dot gate nonvolatile memory (QDNVM) devices with larger thr...
Nanocrystal memories represent a promising candidate for the scaling of FLASH memories. In these dev...
The room temperature-operation of a single-electron metal-oxide- semiconductor (MOS) memory with a d...
We demonstrate a memory effect in self-assembled InAs/Al0.9Ga0.1As quantum dots (QDs) near room temp...
We study the role that the denuded zone around Si nanocrystals obtained by chemical vapor deposition...
This paper reviews the main achievements towards the realization of memories where the information i...
Thesis (M. Eng. and S.B.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering an...
Hole emission processes from self-organized GaAs(0.4)Sb(0.6)/GaAs quantum dots embedded in a p-n dio...
To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon rich oxide (SR...
Сharge trapping in self-aligned single-dot memory devices fabricated by UCL technology based on arse...
Silicon quantum dots have been deposited on top of a 3-nm tunnel oxide by Low Pressure Chemical Vapo...
A study was conducted on metal-oxide-semiconductor (MOS) capacitor and transistor (MOSFET) structure...
To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon-rich oxide (SR...
Nanometer-size Si quantum dots (Si-QDs) with and without Ge core were prepared on thermally-grown Si...
We have realized silicon quantum dots embedded in SiO2 which act as nano-floating gates of MOS memor...
This dissertation presents novel quantum dot gate nonvolatile memory (QDNVM) devices with larger thr...
Nanocrystal memories represent a promising candidate for the scaling of FLASH memories. In these dev...
The room temperature-operation of a single-electron metal-oxide- semiconductor (MOS) memory with a d...
We demonstrate a memory effect in self-assembled InAs/Al0.9Ga0.1As quantum dots (QDs) near room temp...
We study the role that the denuded zone around Si nanocrystals obtained by chemical vapor deposition...
This paper reviews the main achievements towards the realization of memories where the information i...
Thesis (M. Eng. and S.B.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering an...
Hole emission processes from self-organized GaAs(0.4)Sb(0.6)/GaAs quantum dots embedded in a p-n dio...
To form crystalline Si dots embedded in SiO2, we have deposited thin films of silicon rich oxide (SR...
Сharge trapping in self-aligned single-dot memory devices fabricated by UCL technology based on arse...