Firstly, this work presents an analysis pointing the impacts of the FinFET technology in the transistor network generation during the logic synthesis step. This analysis presents some case studies demonstrating that a new paradigm has been introduced by the double-gate devices, like the independent-gate (IG) FinFETs. Moreover, this work demonstrates that this new paradigm introduces a lack to be explored. Since the conventional methods for transistor network generation are not able to explore the potential provided by double-gate devices. Thus, this work proposes two alternative methods for IG FinFET-based transistor network generation. The first one is a graph-based method, which aims to find promising patterns to explore the potential pro...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
During analysis of complexities of the Metal Oxide Semiconductor Field Effect Transistors (MOSFET) t...
Scaling of single-gate bulk MOSFET faces great challenges in the nanometer regime due to the severe ...
The FinFET technology is widely recognized as the leading alternative to solve problems minimizatio...
The CMOS planar technology has been used in fabrication of integrated circuits in the last decades. ...
The evolution of the Integrated Circuits Technology demands optimization of IC design. Nowadays, man...
The Independent-Gate FinFET is introduced as a novel device structure that combines several innovati...
The scaling of MOS transistor has been the main manufacturing strategy for improving integrated circ...
In this work, a novel method to synthesize digital integrated circuits (ICs) based on threshold logi...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
This paper describes gate work function and oxide thickness tuning to realize novel circuits using ...
Esta Tese apresenta os resultados da simulação do transporte eletrônico em três dimensões (3D) no na...
Independent-Gate (IG) FinFET is a promising device in circuit applications due to its two separated ...
Circuitos integrados VLSI (Very Large Scale Integration) usando nanotecnologia demandam novos materi...
The continuous growth of global demand for semiconductor products (in a broad range of sectors, such...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
During analysis of complexities of the Metal Oxide Semiconductor Field Effect Transistors (MOSFET) t...
Scaling of single-gate bulk MOSFET faces great challenges in the nanometer regime due to the severe ...
The FinFET technology is widely recognized as the leading alternative to solve problems minimizatio...
The CMOS planar technology has been used in fabrication of integrated circuits in the last decades. ...
The evolution of the Integrated Circuits Technology demands optimization of IC design. Nowadays, man...
The Independent-Gate FinFET is introduced as a novel device structure that combines several innovati...
The scaling of MOS transistor has been the main manufacturing strategy for improving integrated circ...
In this work, a novel method to synthesize digital integrated circuits (ICs) based on threshold logi...
Abstract—FinFET technology has been proposed as a promising alternative for deep sub-micron CMOS tec...
This paper describes gate work function and oxide thickness tuning to realize novel circuits using ...
Esta Tese apresenta os resultados da simulação do transporte eletrônico em três dimensões (3D) no na...
Independent-Gate (IG) FinFET is a promising device in circuit applications due to its two separated ...
Circuitos integrados VLSI (Very Large Scale Integration) usando nanotecnologia demandam novos materi...
The continuous growth of global demand for semiconductor products (in a broad range of sectors, such...
In this paper we propose double gate transistor i.e. FINFETS circuits. It is the substitute of bulk ...
During analysis of complexities of the Metal Oxide Semiconductor Field Effect Transistors (MOSFET) t...
Scaling of single-gate bulk MOSFET faces great challenges in the nanometer regime due to the severe ...