The suppression of parasitic conductivity at the substrate/MBE regrowth interface in GaN/AlGaN heterostructures by carbon δ-doping is reported. Parasitic conductivity results from silicon adhesion at the GaN substrate surface; its removal before loading the substrates into the UHV growth chamber seems to be impossible. This contamination and the resulting parasitic conductivity is particularly detrimental when growing on unintentionally doped substrates since it masks the 2D transport properties in lateral transport devices even at cryogenic temperatures. The formation of this parasitic channel can be impeded by compensating the silicon-induced charges through carbon δ-doping. In consequence, the intrinsic 2D channel properties can be studi...
We have systematically studied the origin of high gate-leakage currents in AlGaN/GaN high electron m...
Current-transport mechanisms were investigated in Schottky contacts on AlInN/AlN/GaN single channel ...
Excellent n-type GaN layers have been grown by all of the major epitaxial techniques: MBE, MOCVD, an...
The performance of GaN-on-Silicon electronic devices is severely degraded by the presence of a paras...
In this article, a metal/carbon-doped GaN (GaN:C)/Si-doped GaN (GaN:Si) structure was used to invest...
In this work, we investigated the magnetotransport properties of a two dimensional electron gas host...
The performance of transistors designed specifically for high-frequency applications is critically r...
The performance of transistors designed specifically for high-frequency applications is critically r...
The authors would like to thank Dr. E. Litwin-Staszewska from the Institute of High Pressure Physics...
Conductivity and Hall effect measurements were performed before and after Si3N4 passivation of inten...
Conductivity and Hall effect measurements were performed before and after Si3N4 passivation of inten...
In spatially confined system such as heterojunction of high and low band gap material, carriers are ...
International audienceDespite a high lateral breakdown voltage above 10 kV for large contact distanc...
We have demonstrated that deep level traps created by B implantation can reduce the contact resistan...
The results of an experimental study of quantum correction of electron-electron interaction (EEI) to...
We have systematically studied the origin of high gate-leakage currents in AlGaN/GaN high electron m...
Current-transport mechanisms were investigated in Schottky contacts on AlInN/AlN/GaN single channel ...
Excellent n-type GaN layers have been grown by all of the major epitaxial techniques: MBE, MOCVD, an...
The performance of GaN-on-Silicon electronic devices is severely degraded by the presence of a paras...
In this article, a metal/carbon-doped GaN (GaN:C)/Si-doped GaN (GaN:Si) structure was used to invest...
In this work, we investigated the magnetotransport properties of a two dimensional electron gas host...
The performance of transistors designed specifically for high-frequency applications is critically r...
The performance of transistors designed specifically for high-frequency applications is critically r...
The authors would like to thank Dr. E. Litwin-Staszewska from the Institute of High Pressure Physics...
Conductivity and Hall effect measurements were performed before and after Si3N4 passivation of inten...
Conductivity and Hall effect measurements were performed before and after Si3N4 passivation of inten...
In spatially confined system such as heterojunction of high and low band gap material, carriers are ...
International audienceDespite a high lateral breakdown voltage above 10 kV for large contact distanc...
We have demonstrated that deep level traps created by B implantation can reduce the contact resistan...
The results of an experimental study of quantum correction of electron-electron interaction (EEI) to...
We have systematically studied the origin of high gate-leakage currents in AlGaN/GaN high electron m...
Current-transport mechanisms were investigated in Schottky contacts on AlInN/AlN/GaN single channel ...
Excellent n-type GaN layers have been grown by all of the major epitaxial techniques: MBE, MOCVD, an...