Add to ORKGIn this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy
Atomic layer deposition (ALD) is a technique that is able to provide self-limited monolayer depositi...
In situ characterization of the chemical reactions in atomic layer deposition (ALD) processes in flo...
Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) is an emerging high-...
An apparatus was constructed which allowed a Nicolet Magna 550 Fourier Transform Infrared Spectromet...
This project is the integration of a Nicolet Magna 550 FTIR Machine into the FTIR Systems at BSU in ...
Aiming to process control of industrial high yield / high volume CVD reactors, the potential of Four...
In this thesis, in situ Fourier transform infrared (FTIR) spectroscopy was used to study: i) the gro...
Atomic layer deposition (ALD) is a novel and promising film deposition method for microelectronics a...
Atomic layer deposition (ALD) is a form of chemical vapor deposition that uses cyclic, sequential ga...
Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-pha...
In the search for sensor based atomic layer deposition (ALD) process to accelerate process learning ...
A novel in situ infrared (IR) approach is demonstrated for investigating and identifying ALD surface...
This thesis was designed to test the hypothesis that: Sub-Threshold Limit Value (TLV) concentrations...
In this note it is demonstrated that optical emission spectroscopy (OES) is an easy-to-implement and...
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce ...
Atomic layer deposition (ALD) is a technique that is able to provide self-limited monolayer depositi...
In situ characterization of the chemical reactions in atomic layer deposition (ALD) processes in flo...
Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) is an emerging high-...
An apparatus was constructed which allowed a Nicolet Magna 550 Fourier Transform Infrared Spectromet...
This project is the integration of a Nicolet Magna 550 FTIR Machine into the FTIR Systems at BSU in ...
Aiming to process control of industrial high yield / high volume CVD reactors, the potential of Four...
In this thesis, in situ Fourier transform infrared (FTIR) spectroscopy was used to study: i) the gro...
Atomic layer deposition (ALD) is a novel and promising film deposition method for microelectronics a...
Atomic layer deposition (ALD) is a form of chemical vapor deposition that uses cyclic, sequential ga...
Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-pha...
In the search for sensor based atomic layer deposition (ALD) process to accelerate process learning ...
A novel in situ infrared (IR) approach is demonstrated for investigating and identifying ALD surface...
This thesis was designed to test the hypothesis that: Sub-Threshold Limit Value (TLV) concentrations...
In this note it is demonstrated that optical emission spectroscopy (OES) is an easy-to-implement and...
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce ...
Atomic layer deposition (ALD) is a technique that is able to provide self-limited monolayer depositi...
In situ characterization of the chemical reactions in atomic layer deposition (ALD) processes in flo...
Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) is an emerging high-...