Add to ORKGA technical report detailing the design, operation and performance evaluation of a custom-built setup intended for dynamic solvent vapor annealing (dSVA) of thin films of block copolymers to enable their collective self-assembly and the adoption of periodic patterns of nanofeatures for later utilization in various nanolithographic schemes. Technical Report</p
We demonstrate ordering of thin block copolymer (BCP) films via direct immersion annealing (DIA) at ...
Using a combination of systematic experiments and Monte Carlo simulations, this report demonstrates ...
The aim of this work was to demonstrated the possibilities and advantages of the controlled solvent ...
A technical report detailing the design, operation and performance evaluation of a custom-built setu...
Block copolymer lithography is a very promising candidate for nanoscale fabrication and is economica...
Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple...
The self-assembly of block copolymers to generate nanopatterns is of great interest as an inexpensiv...
Thomas H. Epps, IIIBlock copolymer thin film phase behavior from self-assembly is significantly affe...
Molecular self-assembly of block copolymers has been pursued as a next generation high-resolution, l...
Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined i...
Block copolymers (BCP) are a unique class of polymers, which can self-assemble into ordered microdom...
Thesis: S.B., Massachusetts Institute of Technology, Department of Materials Science and Engineering...
Thomas H. EppsThe nanoscale self-assembly of block polymers (BP) has spurred interest for the genera...
*S Supporting Information ABSTRACT: Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydi...
A two-stage annealing process for block copolymer films was introduced consisting of a solvent vapor...
We demonstrate ordering of thin block copolymer (BCP) films via direct immersion annealing (DIA) at ...
Using a combination of systematic experiments and Monte Carlo simulations, this report demonstrates ...
The aim of this work was to demonstrated the possibilities and advantages of the controlled solvent ...
A technical report detailing the design, operation and performance evaluation of a custom-built setu...
Block copolymer lithography is a very promising candidate for nanoscale fabrication and is economica...
Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple...
The self-assembly of block copolymers to generate nanopatterns is of great interest as an inexpensiv...
Thomas H. Epps, IIIBlock copolymer thin film phase behavior from self-assembly is significantly affe...
Molecular self-assembly of block copolymers has been pursued as a next generation high-resolution, l...
Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined i...
Block copolymers (BCP) are a unique class of polymers, which can self-assemble into ordered microdom...
Thesis: S.B., Massachusetts Institute of Technology, Department of Materials Science and Engineering...
Thomas H. EppsThe nanoscale self-assembly of block polymers (BP) has spurred interest for the genera...
*S Supporting Information ABSTRACT: Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydi...
A two-stage annealing process for block copolymer films was introduced consisting of a solvent vapor...
We demonstrate ordering of thin block copolymer (BCP) films via direct immersion annealing (DIA) at ...
Using a combination of systematic experiments and Monte Carlo simulations, this report demonstrates ...
The aim of this work was to demonstrated the possibilities and advantages of the controlled solvent ...