Charge-based capacitance measurements (CBCMs) are widely used to estimate on-chip wiring capacitances because of their accuracy and simplicity. Enhanced CMOS transducers for CBCM have been recently proposed that exploit cross-talk to selectively measure cross-coupling capacitances. In this paper we propose two new applications of cross-talk-based capacitance measurements: mismatch measurement of stacked metal-metal capacitor pairs, and localization of wire interruptions. We present the measurement techniques, we discuss their implementation and we report preliminary experimental results
Abstract — An on-chip capacitor mismatches measurement technique is proposed. The use of a beta-mult...
The paper deals with a modified CBCM (Charge-Based Capacitance Measurements) method for nonlinear ca...
[[abstract]]Starting from CIEF (charge injection induced errors) CBCM (charge-based capacitance meas...
Charge-based capacitance measurements (CBCMs) are widely used to estimate on-chip wiring capacitance...
Geometry scaling increases the relative effect of coupling capacitances on performance, power, and n...
We present a simple test structure (derived from the CBCM technique proposed by Sylvester et al.) th...
[[abstract]]In this letter, charge-based capacitance measurement (CBCM) is applied to characterize b...
[[abstract]]In this work, we describe a novel operation of charge-injection-induced error-free charg...
A method and a relative test structure for measuring the coupling capacitance between two interconne...
Interconnection parasitic capacitance is the dominant delay and noise source in modern integrated ci...
The measurement of capacitance by Charge Based Capacitor Measurement (CBCM) is the most widely used ...
Interconnection parasitic capacitance is the dominant delay and noise source in modem integrated cir...
This paper presents a precision mismatch measurement method to characterize an integrated capacitor ...
Crosstalk within cable bundles can degrade system performance. In systems that use shielded twisted-...
Dielectric sensing based on capacitive measurement technology is a favourable measurement approach i...
Abstract — An on-chip capacitor mismatches measurement technique is proposed. The use of a beta-mult...
The paper deals with a modified CBCM (Charge-Based Capacitance Measurements) method for nonlinear ca...
[[abstract]]Starting from CIEF (charge injection induced errors) CBCM (charge-based capacitance meas...
Charge-based capacitance measurements (CBCMs) are widely used to estimate on-chip wiring capacitance...
Geometry scaling increases the relative effect of coupling capacitances on performance, power, and n...
We present a simple test structure (derived from the CBCM technique proposed by Sylvester et al.) th...
[[abstract]]In this letter, charge-based capacitance measurement (CBCM) is applied to characterize b...
[[abstract]]In this work, we describe a novel operation of charge-injection-induced error-free charg...
A method and a relative test structure for measuring the coupling capacitance between two interconne...
Interconnection parasitic capacitance is the dominant delay and noise source in modern integrated ci...
The measurement of capacitance by Charge Based Capacitor Measurement (CBCM) is the most widely used ...
Interconnection parasitic capacitance is the dominant delay and noise source in modem integrated cir...
This paper presents a precision mismatch measurement method to characterize an integrated capacitor ...
Crosstalk within cable bundles can degrade system performance. In systems that use shielded twisted-...
Dielectric sensing based on capacitive measurement technology is a favourable measurement approach i...
Abstract — An on-chip capacitor mismatches measurement technique is proposed. The use of a beta-mult...
The paper deals with a modified CBCM (Charge-Based Capacitance Measurements) method for nonlinear ca...
[[abstract]]Starting from CIEF (charge injection induced errors) CBCM (charge-based capacitance meas...