As the silicon CMOS technology move into the sub-20nm regime, manufacturing limits and fundamental curb the traditional scaling of transistors. Modernization in device structures and materials will be needed for continued transistor miniaturization and equivalent performance improvements. Device dimensions are approaching their scaling limit giving rise to undesirable effects like short channel effects, gate leakage current, drain induced barrier lowering (DIBL) etc. Strained-silicon devices have been receiving enormous attention owing to their potential for achieving higher channel mobility and drive current enhancement and compatibility with conventional silicon processing.In this novel work, an analytical threshold voltage model is devel...
In this dissertation, an above-threshold I-V model framework is constructed for short-channel double...
As CMOS scaling is approaching the limits imposed by oxide tunneling and voltage non-scaling, double...
Abstract-An analytical model for the threshold voltages in a Si/SiGe/Si MOS structure is presented. ...
Abstract—In this paper, an analytical threshold voltage model is developed for a short-channel doubl...
MOSFET (Metal Oxide Semiconductor Field Effect Transistor) is the one of the most important and wide...
In this dissertation analysis of double-material-gate (DMG) strained-Si (s-Si) channel on SiGe subst...
The paper presents a doping dependent threshold voltage model for the short-channel double-gate (DG)...
In this paper, the threshold voltage and subthreshold slope of strained-Si channel n-MOSFETs are det...
The paper presents a doping dependent threshold voltage model for the short-channel double-gate (DG)...
AbstractIn this paper, a 2D analytical model for the Dual Material Surrounding Gate MOSFET (DMSG) by...
AbstractDrain Induced Barrier Lowering(DIBL) effect is prominent as the feature size of MOS device k...
In the present era, down scaling of complementary metal-oxide-semiconductor (CMOS) technology has le...
In this paper, a new physically based analytical threshold-voltage model is presented for biaxial ul...
We propose a new two dimensional (2D) analytical solution of Threshold Voltage for undoped (or light...
In this dissertation, an above-threshold I-V model framework is constructed for short-channel double...
In this dissertation, an above-threshold I-V model framework is constructed for short-channel double...
As CMOS scaling is approaching the limits imposed by oxide tunneling and voltage non-scaling, double...
Abstract-An analytical model for the threshold voltages in a Si/SiGe/Si MOS structure is presented. ...
Abstract—In this paper, an analytical threshold voltage model is developed for a short-channel doubl...
MOSFET (Metal Oxide Semiconductor Field Effect Transistor) is the one of the most important and wide...
In this dissertation analysis of double-material-gate (DMG) strained-Si (s-Si) channel on SiGe subst...
The paper presents a doping dependent threshold voltage model for the short-channel double-gate (DG)...
In this paper, the threshold voltage and subthreshold slope of strained-Si channel n-MOSFETs are det...
The paper presents a doping dependent threshold voltage model for the short-channel double-gate (DG)...
AbstractIn this paper, a 2D analytical model for the Dual Material Surrounding Gate MOSFET (DMSG) by...
AbstractDrain Induced Barrier Lowering(DIBL) effect is prominent as the feature size of MOS device k...
In the present era, down scaling of complementary metal-oxide-semiconductor (CMOS) technology has le...
In this paper, a new physically based analytical threshold-voltage model is presented for biaxial ul...
We propose a new two dimensional (2D) analytical solution of Threshold Voltage for undoped (or light...
In this dissertation, an above-threshold I-V model framework is constructed for short-channel double...
In this dissertation, an above-threshold I-V model framework is constructed for short-channel double...
As CMOS scaling is approaching the limits imposed by oxide tunneling and voltage non-scaling, double...
Abstract-An analytical model for the threshold voltages in a Si/SiGe/Si MOS structure is presented. ...