Crystal material quality is fundamentally important for optoelectronic devices including laser diodes and light emitting diodes. To this end epitaxial lateral overgrowth (ELO) has proven to be a powerful technique for reducing dislocation density in GaN and its alloys [1,2]. Implementation and design of ELO process is, however, critical for obtaining high-quality material with high-efficiency quantum structures for light emitters [3]. ©2010 IEEE
xvii, 186 leaves : ill. (some col.) ; 30 cm.PolyU Library Call No.: [THS] LG51 .H577P EIE 2010 Leung...
Abstract — A-plane InGaN/GaN multiple-quantum wells (MQWs) were grown on a series of nanorod epitaxi...
AbstractNon-polar (11–20) InGaN quantum dots (QDs) have been grown using a modified droplet epitaxy ...
Cataloged from PDF version of article.We study electroabsorption (EA) behavior of InGaN/GaN quantum ...
High-quality GaN/InGaN multiple quantum wells (MQWs) were fabricated on nano-scale epitaxial lateral...
International audienceWe introduce GaN/InGaN light emitting diodes with a dielectric photonic crysta...
International audienceWe introduce GaN/InGaN light emitting diodes with a dielectric photonic crysta...
We report the growth and characterization of thick, completely relaxed {11-22}-oriented InGaN layers...
GaN/InGaN multiple quantum wells (MQWs) were fabricated on nanoscale epitaxial lateral overgrown (NE...
In this study, epitaxial lateral overgrowth (ELOG) on different kinds of patterned hydride vapour ph...
The lack of appropriate substrates has delayed the realisation of devices based on III-nitrides. Cur...
In the epitaxial lateral overgrowth (ELO) of (11{bar 2}0) a-plane GaN, the uneven growth rates of tw...
This article provides a general review of the epitaxial lateral overgrowth (ELO) technology and of a...
We report a two-step growth method to obtain uniformly coalesced epitaxial lateral overgrown a-plane...
High quality GaN is grown on GaN substrate with stripe pattern by metalorganic chemical vapor deposi...
xvii, 186 leaves : ill. (some col.) ; 30 cm.PolyU Library Call No.: [THS] LG51 .H577P EIE 2010 Leung...
Abstract — A-plane InGaN/GaN multiple-quantum wells (MQWs) were grown on a series of nanorod epitaxi...
AbstractNon-polar (11–20) InGaN quantum dots (QDs) have been grown using a modified droplet epitaxy ...
Cataloged from PDF version of article.We study electroabsorption (EA) behavior of InGaN/GaN quantum ...
High-quality GaN/InGaN multiple quantum wells (MQWs) were fabricated on nano-scale epitaxial lateral...
International audienceWe introduce GaN/InGaN light emitting diodes with a dielectric photonic crysta...
International audienceWe introduce GaN/InGaN light emitting diodes with a dielectric photonic crysta...
We report the growth and characterization of thick, completely relaxed {11-22}-oriented InGaN layers...
GaN/InGaN multiple quantum wells (MQWs) were fabricated on nanoscale epitaxial lateral overgrown (NE...
In this study, epitaxial lateral overgrowth (ELOG) on different kinds of patterned hydride vapour ph...
The lack of appropriate substrates has delayed the realisation of devices based on III-nitrides. Cur...
In the epitaxial lateral overgrowth (ELO) of (11{bar 2}0) a-plane GaN, the uneven growth rates of tw...
This article provides a general review of the epitaxial lateral overgrowth (ELO) technology and of a...
We report a two-step growth method to obtain uniformly coalesced epitaxial lateral overgrown a-plane...
High quality GaN is grown on GaN substrate with stripe pattern by metalorganic chemical vapor deposi...
xvii, 186 leaves : ill. (some col.) ; 30 cm.PolyU Library Call No.: [THS] LG51 .H577P EIE 2010 Leung...
Abstract — A-plane InGaN/GaN multiple-quantum wells (MQWs) were grown on a series of nanorod epitaxi...
AbstractNon-polar (11–20) InGaN quantum dots (QDs) have been grown using a modified droplet epitaxy ...