Cataloged from PDF version of article.In this study, we have synthesized boron, carbon, and nitrogen containing films using RF sputter deposition. We investigated the effects of deposition parameters on the chemical environment of boron, carbon, and nitrogen atoms inside the films. Techniques used for this purpose were grazing incidence reflectance-Fourier-transform infrared spectroscopy (GIR-FTIR), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM) and electron energy loss spectroscopy (EELS). GIR-FTIR experiments on the B-C-N films deposited indicated presence of multiple features in the 600 to 1700 cm(-1) range for the infrared (IR) spectra. Analysis of the IR spectra, XPS and the corresponding EELS data from ...
AbstractTwo series of Cr–B–N nanocomposite thin films with various nitrogen and boron contents were ...
Boron carbon nitride (BCN) thin films were deposited by a dual target DC and RF sputtering technique...
Dimension scaling has been the driving force for improved performance of semiconductor integrated ci...
Cataloged from PDF version of article.In this study, we have synthesized boron, carbon, and nitrogen...
Ankara : The Department of Chemistry, Bilkent University, 2012.Thesis (Ph. D.) -- Bilkent University...
Cataloged from PDF version of article.In this study, we implanted N + and N 2 + ions into sputter de...
The following article appeared in Journal of Applied Physics 114.21 (2013): 213508 and may be found ...
Research efforts have been focused in the development of hard and wear resistant coatings over the l...
A novel method for generating boron nitride thin films is currently being developed. This method uti...
Carbon nitride thin films deposited by dc unbalanced magnetron sputtering have been analyzed by high...
Formation of defects in hexagonal and cubic boron nitride (h -BN and c -BN, respectively) under low-...
1 v. (various pagings) : ill. ; 30 cm.PolyU Library Call No.: [THS] LG51 .H577P AP 2006 WongCubic bo...
A great part of interest has been paid for fabricating new materials with novel mechanical, optical,...
c-BN(cubic boron nitride) is known to have extremely high hardness next to diamond, as well as very ...
A balanced planar r.f. powered magnetron sputter source has been used to deposit carbon nitride film...
AbstractTwo series of Cr–B–N nanocomposite thin films with various nitrogen and boron contents were ...
Boron carbon nitride (BCN) thin films were deposited by a dual target DC and RF sputtering technique...
Dimension scaling has been the driving force for improved performance of semiconductor integrated ci...
Cataloged from PDF version of article.In this study, we have synthesized boron, carbon, and nitrogen...
Ankara : The Department of Chemistry, Bilkent University, 2012.Thesis (Ph. D.) -- Bilkent University...
Cataloged from PDF version of article.In this study, we implanted N + and N 2 + ions into sputter de...
The following article appeared in Journal of Applied Physics 114.21 (2013): 213508 and may be found ...
Research efforts have been focused in the development of hard and wear resistant coatings over the l...
A novel method for generating boron nitride thin films is currently being developed. This method uti...
Carbon nitride thin films deposited by dc unbalanced magnetron sputtering have been analyzed by high...
Formation of defects in hexagonal and cubic boron nitride (h -BN and c -BN, respectively) under low-...
1 v. (various pagings) : ill. ; 30 cm.PolyU Library Call No.: [THS] LG51 .H577P AP 2006 WongCubic bo...
A great part of interest has been paid for fabricating new materials with novel mechanical, optical,...
c-BN(cubic boron nitride) is known to have extremely high hardness next to diamond, as well as very ...
A balanced planar r.f. powered magnetron sputter source has been used to deposit carbon nitride film...
AbstractTwo series of Cr–B–N nanocomposite thin films with various nitrogen and boron contents were ...
Boron carbon nitride (BCN) thin films were deposited by a dual target DC and RF sputtering technique...
Dimension scaling has been the driving force for improved performance of semiconductor integrated ci...