International audience90 and 20 nm thick GaP layers on Si substrate grown by various MBE growth modes are studied. A complete analysis is performed using AFM, TEM imaging and X-ray diffraction giving crucial information on structural defects properties and here particularly on antiphase domains. Thermodynamic evolution of antiphase boundaries is then discussed
Advanced structural characterisation techniques which are rapid to use, non-destructive and structur...
International audienceGrowth of GaP (III-V semiconductor) directly deposited on Si has been proposed...
This thesis deals with the development of structural analysis methods of the GaP thin layers heterog...
International audience90 and 20 nm thick GaP layers on Si substrate grown by various MBE growth mode...
International audienceWe have investigated quantitatively anti-phase domains (APD) structural proper...
International audienceIn this work, we investigate the relationship between the surface roughness an...
International audienceWe present a detailed scanning tunneling microscopy (STM) study of GaP(001) MB...
International audienceThis study is carried out in the context of III–V semiconductor monolithic int...
This thesis deals with the development of structural analyses methods of the GaP thin layers heterog...
Advanced structural characterisation techniques which are rapid to use, non-destructive and structur...
International audienceGrowth of GaP (III-V semiconductor) directly deposited on Si has been proposed...
This thesis deals with the development of structural analysis methods of the GaP thin layers heterog...
International audience90 and 20 nm thick GaP layers on Si substrate grown by various MBE growth mode...
International audienceWe have investigated quantitatively anti-phase domains (APD) structural proper...
International audienceIn this work, we investigate the relationship between the surface roughness an...
International audienceWe present a detailed scanning tunneling microscopy (STM) study of GaP(001) MB...
International audienceThis study is carried out in the context of III–V semiconductor monolithic int...
This thesis deals with the development of structural analyses methods of the GaP thin layers heterog...
Advanced structural characterisation techniques which are rapid to use, non-destructive and structur...
International audienceGrowth of GaP (III-V semiconductor) directly deposited on Si has been proposed...
This thesis deals with the development of structural analysis methods of the GaP thin layers heterog...