The formation of boron carbide from BCl[3]-CH[4] and BCl[3]-H[2]-CH[4]-Ar mixtures in an RF plasma was studied and compared with a previous study of the formation of boron from BCl[3]-H[2]-Ar mixtures. The yields of boron carbide were determined under a variety of conditions and the product examined for composition and crystal structure. The products were finely divided powders. X-ray diffraction analysis of boron carbide showed that up to 14.6 wt. % carbon, B[13]C[2] was formed Between 14.6 wt. % and 21.7 wt. % carbon the additional carbon was incorporated into the lattice by random substitution for boron atoms in the B[12] icosahedra. Further carbon appeared as free graphite. The yields of boron and boron carbide were compared with therm...
Boron carbide is a promising super-hard semiconducting material for refractory applications ranging ...
International audienceAmorphous boron carbide coatings have been prepared by CVD from CH4/BCl3/H2 pr...
Chemical vapor deposition (CVD) of boron from BCl3 and Hz was investigated in a dual-impinging jet r...
The reduction of boron trichloride to boron by hydrogen in a radio-frequency plasma has been investi...
Nearly pure boron carbide free from impurities was produced on a tungsten substrate in a dual imping...
International audienceThe synthesis of boron carbide from its elements (boron and carbon) has been s...
The plasma-enhanced chemical vapor deposition of boron carbide was investigated on quartz glass and ...
Boron carbide was produced on tungsten substrate in a dual impinging-jet CVD reactor from a gas mixt...
Results of experimental investigations on the endothermic reduction of BCl3 in a hydrogen thermal pl...
International audienceThe formation of boron carbide under high pressures and from elemental reactan...
Production of beta-rhombohedral boron carbide (B4C) on a tungsten substrate by the chemical vapor de...
Boron powder was synthetized by reducing a boron halide in a microwave plasma : BCl3 + 3/2 H2[MATH]B...
This paper presents the experimental results on synthesis of boron carbide from its elements. Boron ...
Boron carbide is a promising super-hard semiconducting material for refractory applications ranging ...
International audienceAmorphous boron carbide coatings have been prepared by CVD from CH4/BCl3/H2 pr...
Chemical vapor deposition (CVD) of boron from BCl3 and Hz was investigated in a dual-impinging jet r...
The reduction of boron trichloride to boron by hydrogen in a radio-frequency plasma has been investi...
Nearly pure boron carbide free from impurities was produced on a tungsten substrate in a dual imping...
International audienceThe synthesis of boron carbide from its elements (boron and carbon) has been s...
The plasma-enhanced chemical vapor deposition of boron carbide was investigated on quartz glass and ...
Boron carbide was produced on tungsten substrate in a dual impinging-jet CVD reactor from a gas mixt...
Results of experimental investigations on the endothermic reduction of BCl3 in a hydrogen thermal pl...
International audienceThe formation of boron carbide under high pressures and from elemental reactan...
Production of beta-rhombohedral boron carbide (B4C) on a tungsten substrate by the chemical vapor de...
Boron powder was synthetized by reducing a boron halide in a microwave plasma : BCl3 + 3/2 H2[MATH]B...
This paper presents the experimental results on synthesis of boron carbide from its elements. Boron ...
Boron carbide is a promising super-hard semiconducting material for refractory applications ranging ...
International audienceAmorphous boron carbide coatings have been prepared by CVD from CH4/BCl3/H2 pr...
Chemical vapor deposition (CVD) of boron from BCl3 and Hz was investigated in a dual-impinging jet r...