The precise conditions under which ions are generated in the ion source can have a major impact on how well the source performs, and how much of the extracted beam current can be transported. Because of the commercial focus on the repeatability and reliability of the overall ion implantation process, this vital aspect of the machine has received little scientific attention. hi order to address this issue, detailed studies of both the source and beam plasmas have been initiated. The research described in this thesis, was concerned with the former, and the characterisation of boron trifluoride (BF3) and argon plasmas created in a commercial indirectly heated cathode high current ion source, is described. Boron is still the main p-type dopant ...
A space plasma facility has been operated with a back-diffusion-type plasma source installed in a mi...
Triode discharges are widely used in plasma assisted physical vapour deposition techniques to enhanc...
In the last years, interest for high densities etching sources has rose dramatically in the semicond...
In this work, we present the experimental results of plasma parameters using a Freeman type ion sour...
Hollow cathodes are sources of electrons used for gas ionization and beam neutralization in Hall eff...
International audienceThis paper compares two methods to analyze Langmuir probe data obtained in ele...
A Langmuir probe study in BCl3, SF6, and mixtures of BCl3/SF6 capacitively-coupled plasmas is presen...
This experimental work is concerned with measurement of elementary characteristics of plasma - poten...
The Source for the Production of Ions of Deuterium Extracted from an RF plasma (SPIDER) experiment i...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing i...
Langmuir probe measurements are performed in magnetized expanding plasmas of different compositions....
Langmuir probe measurements are performed in magnetized expanding plasmas of different eompositions....
A space plasma facility has been operated with a back-diffusion-type plasma source installed in a mi...
Triode discharges are widely used in plasma assisted physical vapour deposition techniques to enhanc...
In the last years, interest for high densities etching sources has rose dramatically in the semicond...
In this work, we present the experimental results of plasma parameters using a Freeman type ion sour...
Hollow cathodes are sources of electrons used for gas ionization and beam neutralization in Hall eff...
International audienceThis paper compares two methods to analyze Langmuir probe data obtained in ele...
A Langmuir probe study in BCl3, SF6, and mixtures of BCl3/SF6 capacitively-coupled plasmas is presen...
This experimental work is concerned with measurement of elementary characteristics of plasma - poten...
The Source for the Production of Ions of Deuterium Extracted from an RF plasma (SPIDER) experiment i...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing i...
Langmuir probe measurements are performed in magnetized expanding plasmas of different compositions....
Langmuir probe measurements are performed in magnetized expanding plasmas of different eompositions....
A space plasma facility has been operated with a back-diffusion-type plasma source installed in a mi...
Triode discharges are widely used in plasma assisted physical vapour deposition techniques to enhanc...
In the last years, interest for high densities etching sources has rose dramatically in the semicond...