This paper compares two popular high power, high efficiency modes of operation, class F and inverse class F, and assesses the peak obtainable drain efficiencies when using Si LDMOS devices in a limited bandwidth design. Optimum class F and inverse class F conditions are presented using active harmonic load-pull measurements, and it was found that a higher drain efficiency was achieved in the class F configuration. This result is due to the limitations imposed by the soft voltage breakdown occurring due to the extended voltage swings inherent to inverse class F, as a consequence generating unwanted current content during the off cycle. This significantly reduces the peak measured efficiency using Si LDMOS devices when implementing an inverse...
[[abstract]]In the power management applications, the lateral double-diffusion MOS (LDMOS) transisto...
The emergence of new communication standards has put a key challenge for semiconductor industry to d...
An UHV n-channel LDMOS transistor is usually used for the power management AC-DC convertor that need...
This paper compares two popular high power, high efficiency modes of operation, class F and inverse ...
This paper demonstrates that by robust waveform engineering it is possible for high power Si LDMOS t...
Two inverse Class F power amplifiers working at 1 GHz and 1.8 GHz respectively have been developed. ...
In mobile communication new applications like wireless internet and mobile video have increased the ...
The optimum bias point for an inverse class-F power amplifier is discussed in this paper from a time...
The lateral double-diffused MOS (LDMOS) transistor has traditionally been a high-voltage device used...
We present drain and source-centric design optimizations of a linear P-top and dual-channel conducti...
The behaviour of a deep depletion (DD) silicon on insulator (SOI) lateral MOS (LDMOS) is analysed. D...
Achieving optimal efficiency in FET-based power amplifiers used in envelope tracking (ET) architectu...
Today, semiconductor industry derives about 10% of its multi-billion dollar revenue from power semic...
A new device structure named IDLDMOS is proposed to overcome the power LDMOS limit (R-on, (sp) propo...
[[abstract]]In the power management applications, the lateral double-diffusion MOS (LDMOS) transisto...
The emergence of new communication standards has put a key challenge for semiconductor industry to d...
An UHV n-channel LDMOS transistor is usually used for the power management AC-DC convertor that need...
This paper compares two popular high power, high efficiency modes of operation, class F and inverse ...
This paper demonstrates that by robust waveform engineering it is possible for high power Si LDMOS t...
Two inverse Class F power amplifiers working at 1 GHz and 1.8 GHz respectively have been developed. ...
In mobile communication new applications like wireless internet and mobile video have increased the ...
The optimum bias point for an inverse class-F power amplifier is discussed in this paper from a time...
The lateral double-diffused MOS (LDMOS) transistor has traditionally been a high-voltage device used...
We present drain and source-centric design optimizations of a linear P-top and dual-channel conducti...
The behaviour of a deep depletion (DD) silicon on insulator (SOI) lateral MOS (LDMOS) is analysed. D...
Achieving optimal efficiency in FET-based power amplifiers used in envelope tracking (ET) architectu...
Today, semiconductor industry derives about 10% of its multi-billion dollar revenue from power semic...
A new device structure named IDLDMOS is proposed to overcome the power LDMOS limit (R-on, (sp) propo...
[[abstract]]In the power management applications, the lateral double-diffusion MOS (LDMOS) transisto...
The emergence of new communication standards has put a key challenge for semiconductor industry to d...
An UHV n-channel LDMOS transistor is usually used for the power management AC-DC convertor that need...