Factors influencing electrochemical oxidation of m-cresol at boron-doped diamond electrode

This study investigates electrochemical oxidation of m-cresol on boron-doped diamond electrode using direct current voltammetry (DCV), differential pulse voltametry (DPV) and cyclic voltammetry (CV). In aqueous media in pH range 2.0 - 12.0 m-cresol provides one oxidation peak. The electrode reaction is diffusion-controled. Because of electrode passivation two types of pretreatment were applied for reactivation of electrode surface., i.e. alumina polishing and anodic activation using potential of +2400 mV. Peak heights and potentials are strongly dipending on the type of pretreatment for DCV and DPV - the difference in peak potentials can reach 430 mV. Using optimal conditions for alumina polishing in 0.01 μmol·L-1 NaOH the linear dynamic range is 1.0 - 75 μmol·L-1 for DCV and 0.75 - 75 μmol·L-1 for DPV. And for anodic activation in BR buffer pH 2.0 the linear dynamic range is 0.75 - 75 μmol·L-1 for DCV and DPV. The influence of boron-doping level was investigated using a semiconductive and mettalic-type BDD film. For the latter the sensitivity in DP voltammetry is two times higer and for both types the linear dynamic range is ca 1 - 25 μmol·L-1 . The voltammetric response of m-cresol was further investigated in the presence of cationic surfactants. In the presence of CTAB and CPB the peak current..