© 2020 The Authors. Advanced Materials Interfaces published by Wiley-VCH GmbH A novel atomic layer method for encapsulating individual micro- and nano-particles with thin (sub-10-nm) dielectric films is presented. This method leverages the diffusion of vapor-phase precursors through an underlying inert polymer film to achieve growth of a metal oxide film on all sides of the particle simultaneously, even on the side that is in contact with the substrate. Crucially, the deposition is performed on stationary particles and does not require an agitation mechanism or a special reaction chamber. Here, conformal coatings of alumina are shown to improve stability in aqueous environments for two optically relevant particles: compound semiconductor la...
Atomic layer deposition (ALD) is a self-limited growth method which relies on sequential reactions o...
The controlled deposition of ultra-thin conformal silver nanoparticle films is of interest for appli...
Spatial atomic layer deposition can be used as a high-throughput manufacturing technique in function...
Particles are widely used in the chemical industry as raw material and end product. In many applicat...
The goal of this work is to explore atomic layer deposition (ALD) as a thin film coating technique t...
International audienceWe propose a method for the elaboration, in a single step and in a confined ch...
Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous reactant...
Herein we demonstrate a simplified, ‘poor-man's’ form of the Atomic Layer Deposition (ALD) technique...
An innovative process to uniformly incorporate dispersed nano-scale ceramic inclusions within a poly...
Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous reactant...
The morphology, size, and surface properties of pharmaceutical particles form an essential role in t...
International audienceWe propose a method for the elaboration, in a single step and in a confined ch...
There is strong demands to functionalize nanoparticles for many different industrial and scientific ...
The controlled deposition of ultra-thin conformal silver nanoparticle films is of interest for appli...
Atomic layer deposition (ALD) is a self-limiting subset of chemical vapor deposition that has become...
Atomic layer deposition (ALD) is a self-limited growth method which relies on sequential reactions o...
The controlled deposition of ultra-thin conformal silver nanoparticle films is of interest for appli...
Spatial atomic layer deposition can be used as a high-throughput manufacturing technique in function...
Particles are widely used in the chemical industry as raw material and end product. In many applicat...
The goal of this work is to explore atomic layer deposition (ALD) as a thin film coating technique t...
International audienceWe propose a method for the elaboration, in a single step and in a confined ch...
Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous reactant...
Herein we demonstrate a simplified, ‘poor-man's’ form of the Atomic Layer Deposition (ALD) technique...
An innovative process to uniformly incorporate dispersed nano-scale ceramic inclusions within a poly...
Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous reactant...
The morphology, size, and surface properties of pharmaceutical particles form an essential role in t...
International audienceWe propose a method for the elaboration, in a single step and in a confined ch...
There is strong demands to functionalize nanoparticles for many different industrial and scientific ...
The controlled deposition of ultra-thin conformal silver nanoparticle films is of interest for appli...
Atomic layer deposition (ALD) is a self-limiting subset of chemical vapor deposition that has become...
Atomic layer deposition (ALD) is a self-limited growth method which relies on sequential reactions o...
The controlled deposition of ultra-thin conformal silver nanoparticle films is of interest for appli...
Spatial atomic layer deposition can be used as a high-throughput manufacturing technique in function...