International audienceIn-line process control in microelectronic manufacturing requires real-time and non-invasive monitoring techniques. Among the different metrology techniques, the scatterometry, based on the ellipsometric signatures (i.e stokes coefficients vs. wavelengths) of light scattered by a patterned structures, seems to be well adapted to address this kind of problem. For instance, the shape evolution of a grating in real time during etch processing can be monitored. Traditionally, the direct problem of defining the shape and computing the signature is dealt with modal methods. However, the inverse problem can not be solved as easily. Different classes of algorithms have been introduced (evolutionary, simplex), but the method of...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn-line process control in microelectronics manufacturing requires real-time a...
In-line process control in microelectronics manufacturing requires real-time and non-invasive monito...
International audienceIn-line process control in microelectronics manufacturing requires real-time a...
International audienceDynamic scatterometry is an optical metrology technique designed for the in-si...
International audienceDynamic scatterometry is an optical metrology technique designed for the in-si...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ and real time control of the different process steps in semiconductor device manufacturing b...
In situ and real time control of the different process steps in semiconductor device manufacturing b...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn-line process control in microelectronics manufacturing requires real-time a...
In-line process control in microelectronics manufacturing requires real-time and non-invasive monito...
International audienceIn-line process control in microelectronics manufacturing requires real-time a...
International audienceDynamic scatterometry is an optical metrology technique designed for the in-si...
International audienceDynamic scatterometry is an optical metrology technique designed for the in-si...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ metrology and real time process control are fundamental challenges for the future of the mic...
In situ and real time control of the different process steps in semiconductor device manufacturing b...
In situ and real time control of the different process steps in semiconductor device manufacturing b...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...
International audienceIn situ and real time control of the different process steps in semiconductor ...